Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2017Levet-set-based inverse lithography under random field shape uncertainty in a vector Hopkins imaging model
Wu, X.; Fühner, T.; Erdmann, A.; Lam, E.Y.
Conference Paper
2016Automated source/mask/directed self-assembly optimization using a self-adaptive hierarchical modeling approach
Fühner, T.; Michalak, P.; Wu, X.; Erdmann, A.
Conference Paper
2016Hardware and software framework for an open battery management system in safety-critical applications
Akdere, M.; Giegerich, M.; Wenger, M.; Schwarz, R.; Koffel, S.; Fühner, T.; Waldhör, S.; Wachtler, J.; Lorentz, V.R.H.; März, M.
Conference Paper
2016An integrated source/mask/DSA optimization approach
Fühner, T.; Michalak, P.; Welling, U.; Orozco-Rey, J.C.; Müller, M.
Conference Paper
2016Open, flexible and extensible battery management system for lithium-ion batteries in mobile and stationary applications
Giegerich, M.; Akdere, M.; Freund, C.; Fühner, T.; Grosch, J.L.; Koffel, S.; Schwarz, R.; Waldhör, S.; Wenger, M.; Lorentz, V.R.H.; März, M.
Conference Paper
2015Optical and EUV projection lithography: A computational view
Erdmann, A.; Fühner, T.; Evanschitzky, P.; Agudelo, V.; Freund, C.; Michalak, P.; Xu, D.B.
Journal Article
2014Application of artificial neural networks to compact mask models in optical lithography simulation
Agudelo, V.; Fühner, T.; Erdmann, A.; Evanschitzky, P.
Journal Article
2014Artificial evolution for the optimization of lithographic process conditions
Fühner, Tim
: Erdmann, Andreas
Dissertation
2014Pixel-based defect detection from high-NA optical projection images
Xu, D.B.; Fühner, T.; Erdmann, A.
Journal Article
2014Rigorous simulation and optimization of the lithography/directed self-assembly co-process
Fühner, T.; Welling, U.; Müller, M.; Erdmann, A.
Conference Paper
2013Application of artificial neural networks to compact mask models in optical lithography simulation
Agudelo, V.; Fühner, T.; Erdmann, A.; Evanschitzky, P.
Conference Paper
2013Defect parameters retrieval based on optical projection images
Xu, D.; Li, S.; Wang, X.; Fühner, T.; Erdmann, A.
Conference Paper
2013Electrothermal modeling and characterization of high capacity lithium-ion battery systems for mobile and stationary applications
Giegerich, M.; Koffel, S.; Filimon, R.; Grosch, J.L.; Fühner, T.; Wenger, M.M.; Gepp, M.; Lorentz, V.R.H.
Conference Paper
2013Modeling studies on alternative EUV mask concepts for higher NA
Erdmann, A.; Fühner, T.; Evanschitzky, P.; Neumann, J.T.; Ruoff, J.; Gräupner, P.
Conference Paper
2012Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography
Agudelo, V.; Evanschitzky, P.; Erdmann, A.; Fühner, T.
Conference Paper
2012Mutual source, mask and projector pupil optimization
Fühner, T.; Evanschitzky, P.; Erdmann, A.
Conference Paper
2011Accuracy and performance of 3D mask models in optical projection lithography
Agudelo, V.; Evanschitzky, P.; Erdmann, A.; Fühner, T.; Shao, F.; Limmer, S.; Fey, D.
Conference Paper
2011Compensation of mask induced aberrations by projector wavefront control
Evanschitzky, Peter; Shao, Feng; Fühner, Tim; Erdmann, Andreas
Conference Paper
2011Image simulation of projection systems in photolithography
Evanschitzky, Peter; Fühner, Tim; Erdmann, Andreas
Conference Paper
2011Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography
Erdmann, A.; Shao, F.; Agudelo, V.; Fühner, T.; Evanschitzky, P.
Journal Article
2011Predictive modeling of EUV-lithography: The role of mask, optics, and photoresist effects
Erdmann, A.; Evanschitzky, P.; Shao, F.; Fühner, T.; Lorusso, G.; Hendrickx, E.; Goethals, A.M.; Jonckheere, R.; Bret, T.; Hofmann, T.
Conference Paper
2010Efficient simulation of three-dimensional EUV masks for rigorous source mask optimization and mask induced imaging artifact analysis
Evanschitzky, P.; Fühner, T.; Shao, F.; Erdmann, A.
Conference Paper
2010Mask and wafer topography effects in optical and EUV-lithography
Erdmann, A.; Shao, F.; Evanschitzky, P.; Fühner, T.
Conference Paper
2010Mask diffraction analysis and optimization for extreme ultraviolet masks
Erdmann, A.; Evanschitzky, P.; Fühner, T.
Journal Article
2010Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography
Erdmann, A.; Shao, F.; Evanschitzky, P.; Fühner, T.
Conference Paper, Journal Article
2010Topography-aware BARC optimization for double patterning
Liu, S.; Fühner, T.; Shao, F.; Barenbaum, A.; Jahn, J.; Erdmann, A.
Conference Paper
2009Efficient analysis of three dimensional EUV mask imaging artifacts using the waveguide decomposition method
Shao, F.; Evanschitzky, P.; Fühner, T.; Erdmann, A.
Conference Paper
2009Efficient simulation and optimization of wafer topographies in double patterning
Shao, F.; Evanschitzky, P.; Fühner, T.; Erdmann, A.
Conference Paper
2009Exploration of linear and non-linear double exposure techniques by simulation
Petersen, J.S.; Greenway, R.T.; Fühner, T.; Evanschitzky, P.; Shao, F.; Erdmann, A.
Conference Paper
2009Extended Abbe approach for fast and accurate lithography imaging simulations
Evanschitzky, P.; Erdmann, A.; Fühner, T.
Conference Paper
2009Impact of lithography variations on advanced CMOS devices
Lorenz, J.; Kampen, C.; Burenkov, A.; Fühner, T.
Conference Paper
2009Lithography simulation: Modeling techniques and selected applications
Erdmann, A.; Fühner, T.; Shao, F.; Evanschitzky, P.
Conference Paper
2009Mask diffraction analysis and optimization for EUV masks
Erdmann, A.; Evanschitzky, P.; Fühner, T.
Conference Paper
2009Photomasks for semiconductor lithography: From simple shadow casters to complex 3D scattering objects
Erdmann, A.; Reibold, D.; Fühner, T.; Evanschitzky, P.
Conference Paper
2009Rigorous diffraction simulations of topographic wafer stacks in double patterning
Feng, S.; Evanschitzky, P.; Fühner, T.; Erdmann, A.
Conference Paper, Journal Article
2008Investigation of high-resolution contact printing
Meliorisz, B.; Partel, S.; Schnattinger, T.; Fühner, T.; Erdmann, A.; Hudek, P.
Conference Paper, Journal Article
2008On the stability of fully depleted SOI MOSFETs under lithography process variations
Kampen, C.; Fühner, T.; Burenkov, A.; Erdmann, A.; Lorenz, J.; Ryssel, H.
Conference Paper
2008Optimization of mask absorber stacks and illumination settings for contact hole imaging
Erdmann, A.; Fühner, T.; Evanschitzky, P.
Conference Paper
2008Photomasks for semiconductor lithography: From simple shadow casters to complex 3D scattering objects
Erdmann, A.; Reibold, D.; Fühner, T.; Evanschitzky, P.
Conference Paper
2008Rigorous electromagnetic field simulation of two-beam interference exposures for the exploration of double patterning and double exposure scenarios
Erdmann, A.; Evanschitzky, P.; Fühner, T.; Schnattinger, T.; Xu, C.B.; Szmanda, C.
Conference Paper
2008A simulation study on the impact of lithographic process variations on CMOS device performance
Fühner, T.; Kampen, C.; Kodrasi, I.; Burenkov, A.; Erdmann, A.
Conference Paper
2008Simulation-based EUV source and mask optimization
Fühner, T.; Erdmann, A.; Evanschitzky, P.
Conference Paper
2007Direct optimization approach for lithographic process conditions
Fühner, T.; Erdmann, A.; Seifert, S.
Journal Article
2007Dr.LiTHO - a development and research lithography simulator
Fühner, T.; Schnattinger, T.; Ardelean, G.; Erdmann, A.
Conference Paper
2007The impact of the mask stack and its optical parameters on the imaging performance
Erdmann, A.; Fühner, T.; Seifert, S.; Popp, S.; Evanschitzky, P.
Conference Paper
2007LisBON: A framework for parallelisation and hybridisation of optimisation algorithms
Dürr, C.; Fühner, T.; Suganthan, P.N.
Conference Paper
2007Memetic algorithms: Parametric optimization for microlithography
Dürr, C.; Fühner, T.; Tollkühn, B.; Erdmann, A.; Kokai, G.
Book Article
2006Efficient optimization of lithographic process conditions using a distributed, combined global/local search approach
Fühner, T.; Popp, S.; Dürr, C.; Erdmann, A.
Conference Paper
2006A novel framework for distributing computations DisPyTE - distributing Python tasks environment
Fühner, T.; Popp, S.; Jung, T.
Conference Paper, Journal Article
2006Rigorous mask modeling using waveguide and FDTD methods. An assessment for typical hyper NA imaging problems
Erdmann, A.; Evanschitzky, P.; Citarella, G.; Fühner, T.; Bisschop, P. de
Conference Paper
2005Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm
Fühner, T.; Erdmann, A.
Conference Paper
2005Modeling of industrial bulk crystal growth - State of the art and challenges
Fischer, B.; Friedrich, J.; Jung, T.; Hainke, M.; Dagner, J.; Fühner, T.; Schwesig, P.
Journal Article
2004Genetic algorithm for optimization and calibration in process simulation
Fühner, T.; Erdmann, A.; Ortiz, C.J.; Lorenz, J.
Conference Paper
2004Genetic algorithms for geometry optimization in lithographic imaging systems
Fühner, T.; Erdmann, A.; Schnattinger, T.
Conference Paper
2004Genetic algorithms to improve mask and illumination geometries in lithographic imaging systems
Fühner, T.; Erdmann, A.; Farkas, R.; Tollkühn, B.; Kokai, G.
Conference Paper
2004A physically based model for the spatial and temporal evolution of self-interstitial agglomerates in ion-implanted silicon
Ortiz, C.J.; Pichler, P.; Fühner, T.; Cristiano, F.; Colombeau, B.; Cowern, N.E.B.; Claverie, A.
Journal Article
2004Towards automatic mask and source optimization for optical lithography
Erdmann, A.; Fühner, T.; Schnattinger, T.; Tollkühn, B.
Conference Paper
2004Use of genetic algorithms for the development and optimization of crystal growth processes
Fühner, T.; Jung, T.
Conference Paper, Journal Article
2003Mask and source optimization for lithographic imaging systems
Erdmann, A.; Farkas, R.; Fühner, T.; Tollkühn, B.; Kokai, G.
Conference Paper
2003Will Darwin's law help us to improve our resist models?
Tollkühn, B.; Fühner, T.; Matiut, D.; Erdmann, A.; Semmler, A.; Kuchler, B.; Kokai, B.
Conference Paper