Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2019Epitaxial n++-InGaAs ultra-shallow junctions for highly scaled n-MOS devices
Tejedor, P.; Drescher, M.; Vázquez, L.; Wilde, L.
Journal Article
2018LPCVD in-situ doped silicon for thermoelectric applications
Calvo, Jesús; Drescher, Maximilian; Kühnel, Kati; Sauer, Bodo; Müller, Michael; Schmidt, Christian; Boui, Fatima; Völklein, Friedemann; Wagner-Reetz, Maik
Journal Article, Conference Paper
2017Charakterisierung der Zuverlässigkeit in der High-k Metal Gate Technologie
Drescher, Maximilian; Erben, Elke; Grass, Carsten; Trentzsch, Martin; Lazarevic, Florian; Leitsmann, Roman; Plaenitz, Philipp; Mchedlidze, Teimuraz; Seidel, Konrad; Liske, Romy; Bartha, Johann Wolfgang
Conference Paper
2017Interface traps in 28 nm node field effect transistors detected by capacitance transient spectroscopy
Mchedlidze, T.; Drescher, M.; Erben, E.; Weber, J.
Journal Article
2017Modeling the effects of lanthanum, nitrogen, and fluorine treatments of Si-SiON-HfO2-TiN gate stacks in 28 nm high-k-metal gate technology
Leitsmann, R.; Lazarevic, F.; Drescher, M.; Erben, E.
Journal Article
2017Nitrogen Engineering in the Ultrathin SiO2 Interface Layer of High- k CMOS Devices: A First-Principles Investigation of Fluorine, Oxygen, and Boron Defect Migration
Lazarevic, F.; Leitsmann, R.; Drescher, M.; Erben, E.; Plänitz, P.; Schreiber, M.
Journal Article
2016Capacitance transient spectroscopy measurements on high-k metal gate field effect transistors fabricated using 28nm technology node
Mchedlidze, T.; Drescher, M.; Erben, E.; Weber, J.
Conference Paper
2016La-doped ZrO2 based Back End of Line (BEoL) decoupling capacitors
Weinreich, Wenke; Seidel, Konrad; Polakowski, Patrick; Drescher, Maximilian; Gummenscheimer, A.; Nolan, M.G.; Cheng, L.; Triyoso, D.H.
Poster
2016La-doped ZrO2 based BEoL decoupling capacitors
Weinreich, W.; Seidel, K.; Polakowski, P.; Drescher, M.; Gummenscheimer, A.; Nolan, M.G.; Cheng, L.; Triyoso, D.H.
Conference Paper
2016LPCVD in-situ doped silicon for thermoelectric applications
Calvo, J.; Müller, M.; Sauer, B.; Drescher, M.; Schmidt, C.; Völklein, F.; Wagner-Reetz, M.
Presentation
2015Fluorine interface treatments within the gate stack for defect passivation in 28 nm high-k metal gate technology
Drescher, M.; Naumann, A.; Sundqvist, J.; Erben, E.; Grass, C.; Trentzsch, M.; Lazarevic, F.; Leitsmann, R.; Plaenitz, P.
Journal Article
2015Integration challenges of ferroelectric hafnium oxide based embedded memory (Invited)
Müller, Johannes; Polakowski, Patrick; Paul, Jan; Riedel, Stefan; Hoffmann, Raik; Drescher, Maximilian; Slesazeck, Stefan; Müller, Stefan; Mulaosmanovic, Halid; Schröder, Uwe; Mikolajick, Thomas; Flachowsky, Stefan; Erben, Elke; Smith, Elliot; Binder, Robert; Triyoso, Dina H.; Metzger, Joachim; Kolodinski, Sabine
Conference Paper
2015Stabilizing the ferroelectric phase in doped hafnium oxide
Hoffmann, M.; Schroeder, U.; Schenk, T.; Shimizu, T.; Funakubo, H.; Sakata, O.; Pohl, D.; Drescher, M.; Adelmann, C.; Materlik, R.; Kersch, A.; Mikolajick, T.
Journal Article
2014Influence of nitrogen trap states on the electronic properties of high-k metal gate transistors
Ocker, J.; Kupke, S.; Slesazeck, S.; Mikolajick, T.; Erben, E.; Drescher, M.; Naumann, A.; Lazarevic, F.; Leitsmann, R.
Conference Paper
2013TEMAZ/O-3 atomic layer deposition process with doubled growth rate and optimized interface properties in metal-insulator-metal capacitors
Weinreich, W.; Tauchnitz, T.; Polakowski, P.; Drescher, M.; Riedel, S.; Sundqvist, J.; Seidel, K.; Shirazi, M.; Elliott, S.D.; Ohsiek, S.; Erben, E.; Trui, B.
Journal Article
2011Yb:YAG innoslab amplifier: Efficient high repetition rate subpicosecond pumping system for optical parametric chirped pulse amplification
Schulz, M.; Riedel, R.; Willner, A.; Mans, T.; Schnitzler, C.; Russbueldt, P.; Dolkemeyer, J.; Seise, E.; Gottschall, T.; Hädrich, S.; Duesterer, S.; Schlarb, H.; Feldhaus, J.; Limpert, J.; Faatz, B.; Tünnermann, A.; Rossbach, J.; Drescher, M.; Tavella, F.
Journal Article
2006Design, fabrication, and analysis of chirped multilayer mirrors for reflection of extreme-ultraviolet attosecond pulses
Wonisch, A.; Neuhäusler, U.; Kabachnik, N.M.; Uphues, T.; Uiberacker, M.; Yakovlev, V.; Krausz, F.; Drescher, M.; Kleineberg, U.; Heinzmann, U.
Journal Article