Fraunhofer-Gesellschaft

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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
1998Modeling parameter extraction for DNQ-Novolac thin film resists
Henderson, C.L.; Scheer, S.A.; Tsiartas, P.C.; Rathsack, B.M.; Sagan, J.P.; Dammel, R.R.; Erdmann, A.; Willson, C.G.
Conference Paper
1998Some aspects of thick film resist performance and modeling
Erdmann, A.; Henderson, C.L.; Willson, C.G.; Dammel, R.R.
Conference Paper
1990Percolation theory and resist development in X-ray lithography
Oertel, H.; Weiß, M.; Dammel, R.; Theis, J.
Conference Paper
1990Percolation theory and resist development in XRL
Oertel, H.K.; Dammel, R.; Theis, J.; Weiß, M.
Conference Paper
1989Computer-aided resist modelling with extended xmas in X-ray lithography
Chlebek, J.; Huber, H.-L.; Oertel, H.; Dammel, R.; Lingnau, J.; Theis, J.; Weiß, M.
Journal Article
1989The E-beam application of highly sensitive positive and negative tone X-ray resists for X-ray mask making
Dammel, R.; Demmeler, R.; Ehrlich, C.; Kohlmann, K.; Lingnau, J.; Pongratz, S.; Reimer, K.; Scheunemann, U.; Theis, J.
Conference Paper
1989E-beam application of highly sensitive positive and negative-tone resists for x-ray mask making
Dammel, R.; Demmeler, R.; Ehrlich, C.; Hessemer, W.; Kohlmann, K.; Lingnau, J.; Pongratz, S.; Reimer, K.; Scheunemann, U.; Theis, J.
Conference Paper
1989High sensitivity positive tone X-ray resist: RAY-PF performance under e-beam exposure
Menschig, A.; Forchel, A.; Dammel, R.; Lingnau, J.; Pongratz, S.; Scheunemann, U.; Theis, J.
Conference Paper
1989Negative-tone high-resolution photocatalytic resist for X-ray lithography
Huber, H.-L.; Oertel, H.; Trube, J.; Dammel, R.; Dössel, K.F.; Lingnau, J.; Theis, J.
Journal Article
1989One-layer technique for absorber structuring of E-beam written master masks for X-ray lithography
Ehrlich, C.; Goepel, U.; Demmeler, R.; Pongratz, S.; Reimer, K.; Dammel, R.; Lignau, J.; Theis, J.
Conference Paper
1987Photocatalytic novolak - based positive resist for X-ray lithography - kinetics and simulation
Huber, H.-L.; Oertel, H.; Dössel, K.F.; Dammel, R.; Lingnau, J.; Theis, J.
Journal Article