Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2015Precision laser droplet soldering of components for Multi Shaped Beam Lithography
Burkhardt, T.; Mohaupt, M.; Zaage, B.; Beckert, E.; Eberhardt, R.; Tünnermann, A.; Döring, H.-J.
Conference Paper
2012Development of a precision positioning system for electron beam applications
Mohaupt, M.; Harnisch, G.; Heidler, N.; Beckert, E.; Zerfas, P.; Eberhardt, R.; Tünnermann, A.; Döring, H.-J.; Heine, D.; Klein, M.
Conference Paper
2012Packaging technology of multi deflection arrays for multi-shaped beam lithography
Burkhardt, T.; Mohaupt, M.; Hornaff, M.; Zaage, B.; Beckert, E.; Döring, H.-J.; Slodowski, M.; Reimer, K.; Witt, M.; Eberhardt, R.; Tünnermann, A.
Conference Paper
2011Investigations on clearance seal units for moving elements in an ultra-high vacuum region
Heidler, N.; Mohaupt, M.; Risse, S.; Döring, H.-J.
Conference Paper
2006Assembly of an aperture plate system for projection mask-less lithography
Mohaupt, M.; Eberhardt, R.; Damm, C.; Peschel, T.; Tünnermann, A.; Haugeneder, E.; Döring, H.-J.; Brandstätter, C.
Conference Paper, Journal Article
2006Projection mask-less lithography (PML2): First results from the multi beam blanking demonstrator
Eder-Kapl, S.; Haugeneder, E.; Langfischer, H.; Reimer, K.; Eichholz, J.; Witt, M.; Doering, H.-J.; Heinitz, J.; Brandstätter, C.
Conference Paper, Journal Article
2005Demonstrators: A vital step forward for projection mask-less lithography (PML2)
Brandstätter, C.; Haugeneder, E.; Döring, H.-J.; Elster, T.; Heinitz, J.; Fortagne, O.; Eder-Kapl, S.; Lammer, G.; Jochl, P.; Löschner, H.; Reimer, K.; Saniter, J.; Talmi, M.; Eberhardt, R.; Krönert, K.
Conference Paper
2005Development of microsystem technologies for a monolithically integrated programmable aperture plates system used in maskless 45nm e-beam lithography tools
Witt, M.; Eichholz, J.; Ratzmann, L.; Kähler, D.; Brünger, W.; Reimer, K.; Döring, H.-J.; Haugeneder, E.
Conference Paper
2005Mask manufacture for projection mask-less lithography (PML2)
Reimer, K.; Witt, M.; Kähler, D.; Eichholz, J.; Ratzmann, L.; Brünger, W.; Döring, H.-J.; Haugeneder, E.; Eder-Kapl, S.; Nowak, R.
Conference Paper
2005Proof-of-concept tool development for projection mask-less lithography (PML2)
Döring, H.-J.; Elster, T.; Heinitz, J.; Fortagne, O.; Brandstätter, C.; Haugeneder, E.; Eder-Kapl, S.; Lammer, G.; Löschner, H.; Reimer, K.; Eichholz, J.; Saniter, J.
Conference Paper