| | |
|---|
| 2020 | BEoL Reliability, XPS and REELS Study on low-k Dielectrics to understand Breakdown Mechanisms
Wehring, Bettina; Hoffmann, R.; Gerlich, Lukas; Czernohorsky, Malte; Uhlig, B.; Seidel, R.; Barchewitz, T.; Schlaphof, F.; Meinshausen, L.; Leyens, C. | Conference Paper |
| 2020 | Piezoelectric Response of Polycrystalline Silicon-Doped Hafnium Oxide Thin Films Determined by Rapid Temperature Cycles
Mart, Clemens; Kämpfe, Thomas; Hoffmann, Raik; Eßlinger, Sophia; Kirbach, Sven; Kühnel, Kati; Czernohorsky, Malte; Eng, Lukas M.; Weinreich, Wenke | Journal Article |
| 2019 | Antiferroelektrische, eingebettete Dünnschichtkondensatoren als Energiespeicher für autarke Sensorelemente
Czernohorsky, Malte; Weder, Andreas; Mart, Clemens; Falidas, K.; Kühnel, K.; Viegas, A.E.; Holland, H.-J.; Weinreich, W. | Conference Paper |
| 2019 | Doping hafnium oxide by in-situ precursor mixing
Weinreich, Wenke; Mart, Clemens; Kühnel, Kati; Kämpfe, Thomas; Czernohorsky, Malte | Presentation |
| 2019 | Electrocaloric temperature change in ferroelectric Si-doped hafnium oxide (HfO2) thin films
Mart, Clemens; Kämpfe, Thomas; Müller, Johannes; Pätzold, Björn; Rudolph, Matthias; Czernohorsky, Malte; Weinreich, Wenke | Presentation |
| 2018 | Aspects of high aspect ratio silicon etching - capacitor application
Rudolph, Matthias; Pätzold, Björn; Czernohorsky, Malte | Presentation |
| 2018 | CMOS compatible pyroelectric applications enabled by doped HfO2 films on deep-trench structures
Mart, Clemens; Weinreich, Wenke; Czernohorsky, Malte; Riedel, Stefan; Zybell, Sabine; Kühnel, Kati | Conference Paper |
| 2018 | Frequency domain analysis of pyroelectric response in silicon-doped hafnium oxide (HfO2) thin films
Mart, Clemens; Czernohorsky, Malte; Zybell, Sabine; Kämpfe, Thomas; Weinreich, Wenke | Journal Article |
| 2017 | Enhanced reliability and capacitance stability of ZrO2-based decoupling capacitors by interface doping with Al2O3
Mart, Clemens; Zybell, Sabine; Riedel, Stefan; Czernohorsky, Malte; Seidel, Konrad; Weinreich, Wenke | Journal Article, Conference Paper |
| 2016 | Catalytic ALD of SiO2 as spacer for an E-Beam direct write self-aligned double patterning process on 300 mm wafers
Kühnel, Kati; Riedel, Stefan; Weinreich, Wenke; Thrun, Xaver; Czernohorsky, Malte; Pätzold, Björn; Rudolph, Matthias | Presentation |
| 2016 | Characterization of low temperature plasma generated oxides on germanium based substrates
Poduval, Geedhika Kallidil
: Czernohorsky, Malte (Betreuer); Lakner, Hubert (Gutachter); Fischer, Wolf-Joachim (Gutachter) | Master Thesis |
| 2012 | Introduction of zirconium oxide in a hardmask concept for highly selective patterning of scaled high aspect ratio trenches in silicon
Paul, Jan; Riedel, Stefan; Rudolph, Matthias; Wege, Stephan; Czernohorsky, Malte; Sundqvist, Jonas; Hohle, Christoph; Beyer, Volkhard | Journal Article, Conference Paper |
| 2010 | Analysis of TANOS memory cells with sealing oxide containing blocking dielectric
Beug, M. Florian; Melde, Thomas; Czernohorsky, Malte; Hoffmann, Raik; Paul, Jan; Knöfler, Roman; Tilke, Armin T. | Journal Article |
| 2010 | Formation of an interface layer between Al1-xSixOy thin films and the Si substrate during rapid thermal annealing
Michalowski, Pawel Piotr; Beyer, Volkhard; Czernohorsky, Malte; Kücher, P.; Teichert, Steffen; Jaschke, Gert; Möller, Wolfhard | Journal Article, Conference Paper |
| 2010 | Improved high-temperature etch processing of high-k metal gate stacks in scaled TANOS memory devices
Paul, Jan; Beyer, Volkhard; Czernohorsky, Malte; Beug, M. Florian; Biedermann, Kati; Mildner, Marcus; Michalowski, Pawel Piotr; Schütze, Enrico; Melde, Thomas; Wege, S.; Knöfler, Roman; Mikolajick, Thomas | Conference Paper, Journal Article |
| 2009 | Analysis of trap mechanisms responsible for Random Telegraph Noise and erratic programming on sub-50nm floating gate flash memories
Seidel, Konrad; Hoffmann, Raik; Löhr, Daniel-Andre; Melde, Thomas; Czernohorsky, Malte; Paul, Jan; Beug, M. Florian; Beyer, Volkhard | Conference Paper |
| 2009 | Characterization of the diffusium process in Al2O3 thin films based on ToF-SIMS measurements
Michalowski, Pawel Piotr; Czernohorsky, Malte; Beyer, Volkhard; Jaschke, Gert; Teichert, Steffen | Abstract |
| 2009 | Improvement of 48 nm TANOS NAND cell performance by introduction of a removable encapsulation liner
Beug, M. Florian; Melde, Thomas; Paul, Jan; Bewersdorff-Sarlette, Ulrike; Czernohorsky, Malte; Beyer, Volkhard; Hoffmann, Raik; Seidel, Konrad; Löhr, Daniel-Andre; Bach, Lars; Knöfler, R.; Tilke, Armin T. | Conference Paper |
| 2009 | Select device disturb phenomenon in TANOS NAND flash memories
Melde, Thomas; Beug, M. Florian; Bach, Lars; Tilke, Armin T.; Knöfler, Roman; Bewersdorff-Sarlette, Ulrike; Beyer, Volkhard; Czernohorsky, Malte; Paul, Jan; Mikolajick, Thomas | Journal Article |
| 2009 | TaN metal gate damage during high-k (Al2O3) high-temperature etch
Paul, Jan; Beyer, Volkhard; Michalowski, Pawel Piotr; Beug, M. Florian; Bach, Lars; Ackermann, Marco; Wege, S.; Tilke, Armin T.; Chan, N.; Mikolajick, Thomas; Bewersdorff-Sarlette, Ulrike; Knöfler, Roman; Czernohorsky, Malte; Ludwig, C. | Conference Paper, Journal Article |