Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2009Determination of cross-link density in ion-irradiated polystyrene surfaces from rippling
Karade, Y.; Pihan, S.A.; Brünger, W.H.; Dietzel, A.; Berger, R.; Graf, K.
Journal Article
2007Ion projection surface structuring with noble gas ions at 75 keV
Bruenger, W.H.; Dietzel, A.H.; Loeschner, H.
Conference Paper, Journal Article
2007Oriented nanometer surface morphologies by thermal relaxation of locally cross-linked and stretched polymer samples
Karade, Y.; Graf, K.; Brünger, W.H.; Dietzel, A.; Berger, R.
Journal Article
2006Verfahren zum Herstellen einer Nanostruktur auf einem Substrat
Bruenger, W.H.; Fink, D.
Patent
2003Fabrication and electrical characteristics of carbon nanotube-based microcathodes for use in a parallel electron-beam lithography system
Brünger, W.H.; Eichholz, J.; Hanssen, H.; Friedrich, D.
Journal Article
2003Ion projection direct-structuring for nanotechnology applications
Loeschner, H.; Fantner, E.J.; Korntner, R.; Platzgummer, E.; Stengl, G.; Zeininger, M.; Baglin, J.E.E.; Berger, R.; Brünger, W.H.; Dietzel, A.; Baraton, M.-I.; Merhari, L.
Conference Paper
2003Large-field particle beam optics for projection and proximity printing and for maskless lithography
Löschner, H.; Stengl, G.; Buschbeck, H.; Chalupka, A.; Lammer, G.; Platzgummer, E.; Vonach, H.; Jager, P.W.H. de; Käsmaier, R.; Ehrmann, A.; Hirscher, S.; Wolter, A.; Dietzel, A.; Berger, R.; Grimm, H.; Terris, B.D.; Brünger, W.H.; Gross, G.; Fortagne, O.; Adam, D.; Böhm, M.; Eichhorn, H.; Springer, R.; Butschke, J.; Letzkus, F.; Ruchhöft, P.; Wolfe, J.C.
Journal Article
2003Nanopatterning of magnetic disks by single-step ar+ ion projection
Dietzel, A.; Berger, R.; Loeschner, H.; Platzgummer, E.; Stengl, G.; Bruenger, W.H.; Letzkus, F.
Journal Article
2003Resistless deposition of metallic nanostructures on ion projection sensitized p-Si
Spiegel, A.; Brünger, W.H.; Dzionk, C.; Schmuki, P.
Conference Paper, Journal Article
2002Evaluation of ion projection using heavy ions suitable for resistless patterning of thin magnetic films
Brünger, W.H.; Dzionk, C.; Berger, R.; Grimm, H.; Dietzel, A.; Letzkus, F.; Springer, R.
Journal Article
2002Ion projection direct structuring for patterning of magnetic media
Dietzel, A.; Berger, R.; Grimm, H.; Brünger, W.H.; Dzionk, C.; Letzkus, F.; Springer, R.; Löschner, H.; Platzgummer, E.; Stengl, G.; Bandic, Z.Z.; Terris, B.D.
Journal Article
2002Ion projection printing for patterning of magnetic media
Dietzel, A.; Berger, R.; Grimm, H.; Bruenger, W.H.; Dzionk, C.; Letzkus, F.; Springer, R.; Loeschner, H.; Platzgummer, E.; Terris, B.D.
Conference Paper
2002Ion projection sensitized selective Cu electroplating on uncoated p-Si
Spiegel, A.; Brünger, W.H.; Dzionk, C.; Schmuki, P.
Journal Article
2002Large-field ion-optics for projection and proximity printing and for mask-less lithography (ML2)
Löschner, H.; Stengl, G.; Buschbeck, H.; Chalupka, A.; Lammer, G.; Platzgummer, E.; Vonach, H.; Jager, P.W.H. de; Käsmaier, R.; Ehrmann, A.; Hirscher, S.; Wolter, A.; Dietzel, A.; Berger, R.; Grimm, H.; Terris, B.D.; Brünger, W.H.; Adam, D.; Böhm, M.; Eichhorn, H.; Springer, R.; Butschke, J.; Letzkus, F.; Ruchhöft, P.; Wolfe, J.C.
Conference Paper
2002Nanocomposite resist systems for next-generation lithography
Merhari, L.; Gonsalves, K.E.; Hu, Y.; He, W.; Huang, W.S.; Angelopoulos, M.; Bruenger, W.H.; Dzionk, C.; Torkler, M.
Journal Article
2002Resistless patterning of magnetic storage media using ion projection structuring
Dietzel, A.; Berger, R.; Grimm, H.; Schug, C.; Brünger, W.H.; Dzionk, C.; Letzkus, F.; Springer, R.; Löschner, H.; Platzgummer, E.; Stengl, G.; Anders, S.; Bandic, Z.Z.; Rettner, C.T.; Terris, B.D.; Eichhorn, H.; Böhm, M.; Adam, D.
Conference Paper
2001Carbon films for use as the electron source in a parallel e-Beam lithography system (NDFCT 353)
Milne, W.I.; Teo, K.B.K.; Chhowalla, M.; Amaratunga, G.A.; Yuan, J.; Robertson, J.; Legagneux, P.; Pirio, G.; Pribat, D.; Bouzehouane, K.; Brünger, W.H.; Trautmann, C.
Journal Article
1999Measuring acid generation efficiency in chemically amplified resists with all three beams
Szmanda, C.S.; Brainard, R.L.; Mackevich, J.F.; Awaji, A.; Tanaka, T.; Yamada, Y.; Bohland, J.; Tedesco, S.; Dal'Zotto, B.; Brünger, W.H.; Torkler, M.; Fallmann, W.; Löschner, H.; Käsmaier, R.; Nealey, P.M.; Pawloski, A.R.
Conference Paper
1999Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices
Brünger, W.H.; Torkler, M.; Weiss, M.; Löschner, H.; Leung, K.; Lee, Y.; Hudek, P.; Rangelow, J.W.; Stangl, G.; Fallmann, W.
Conference Paper
1999Resolution improvement of ion projector with a low energy spread multicusp ion source
Brünger, W.H.; Torkler, M.; Leung, K.N.; Lee, Y.; Williams, M.D.; Löschner, H.; Stengl, G.; Fallmann, W.; Paschke, F.; Stangl, G.; Rangelow, J.W.; Hudek, P.
Conference Paper
1998Plasma source for ion and electron beam lithography
Lee, Y.; Leung, K.N.; Fallmann, W.; Torkler, M.; Bruenger, W.H.
Journal Article
1997Chemically amplified deep ultraviolet resist for positive tone ion exposure
Brünger, W.H.; Torkler, M.; Buchmann, L.-M.; Finkelstein, W.
Conference Paper
1997Contamination reduction in low voltage e-beam microscopy for dimensional metrology
Brünger, W.H.; Kleinschmidt, H.; Hassler-Grohne, W.; Bosse, H.
Conference Paper
1997DUV resist UV II HS applied to high resolution e-beam lithography and to masked ion beam proximity and reduction printing
Brünger, W.H.; Buschbeck, H.; Cekan, E.; Eder, S.; Fedynyshyn, T.H.; Hertlein, W.G.; Hudek, P.; Kostic, I.; Loeschner, H.; Rangelow, J.W.; Torkler, M.
Conference Paper
1995Conductivity and reproducibility of e-beam induced deposited tungsten lines
Kohlmann van Platen, K.T.; Schmidt, L.; Brünger, W.H.
Conference Paper
1995Damage characterization of ion beam exposed metal-oxide-semiconductor varactor cells by charge to breakdown measurements
Brünger, W.H.; Buchmann, L.-M.; Naumann, F.; Friedrich, D.; Finkelstein, W.; Mohondro, R.
Conference Paper
1994Direct write pattern placement accuracy for E-beam nanolithography
Reimer, K.; Ehrlich, C.; Köhler, C.; Brünger, W.H.
Conference Paper
1993Application of e-beam nanolithography for absorber structuring of high resolution x-ray masks
Köhler, C.; Brünger, W.H.; Ehrlich, C.; Huber, H.-L.; Reimer, K.
Journal Article
1993Edge roughness of a 200 nm pitch resist pattern fabricated by ion projection lithography
Brünger, W.H.; Blaschke, J.; Torkler, M.; Buchmann, L.-M.
Journal Article
1992E-beam induced fabrication of microstructures
Kohlmann, K.T.; Brünger, W.H.
Conference Paper
1992Fabrication of 3.5 GHz surface acoustic wave filters by ion projection lithography
Kreutzer, M.; Zwicker, G.; Fleischmann, B.; Brünger, W.H.; Buchmann, L.-M.; Torkler, M.
Conference Paper
1992Repair of open stencil masks for ion projection lithography by E-beam induced metal deposition
Kohlmann, K.T.; Brünger, W.H.; Buchmann, L.-M.
Conference Paper
1992Stability and electronic adjustment of ion images projected at 10 x reduction
Brünger, W.H.; Buchmann, L.-M.; Torkler, M.
Journal Article
1991E-beam induced x-ray mask repair with optimized gas nozzle geometry
Thiemann, M.; Brünger, W.H.; Kohlmann, K.T.
Conference Paper
1989Spatial resolution tests of scanning auger microscopy under different topographical conditions
Umbach, A.; Hoyer, A.; Brünger, W.H.
Journal Article
1989X-ray mask repair by electron beam induced metal deposition
Brünger, W.H.
Conference Paper
1988Small spot ESCA and scanning XPS investigations compared to scanning auger microanalysis.
Brünger, W.H.
Journal Article
1986Influence of thin film thickness variations on pattern fidelity of x-ray masks
Betz, H.; Heuberger, A.; Hersener, J.; Bruenger, W.H.
Conference Paper
1984E-beam metrology of chromium master masks and masks for x-ray lithography
Betz, H.; Heuberger, A.; Bruenger, W.H.; Mueller, K.P.
Journal Article
1983E-beam two-coordinate measuring tool for high precision metrology in micro-lithographie
Betz, H.; Heuberger, A.; Somers, J.M.; Bruenger, W.H.
Conference Paper