Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2017175 nm period grating fabricated by i-line proximity mask-aligner lithography
Bourgin, Y.; Voigt, D.; Käsebier, T.; Siefke, T.; Kley, E.-B.; Zeitner, U.D.
Journal Article
2017Mask aligner lithography using laser illumination for versatile pattern generation
Weichelt, T.; Bourgin, Y.; Zeitner, U.D.
Journal Article
2016Advanced photomask fabrication by e-beam lithography for mask aligner applications
Weichelt, T.; Bourgin, Y.; Banasch, M.; Zeitner, U.D.
Conference Paper
2016Alternative high-resolution lithographic technologies for optical applications
Zeitner, U.D.; Weichelt, T.; Bourgin, Y.; Kinder, R.
Conference Paper
2016Large area gold coated nano-needles fabricated by proximity mask aligner lithography for plasmonic AR-structures
Bourgin, Y.; Michaelis, D.; Käsebier, T.; Dannberg, P.; Zeitner, U.D.
Conference Paper
2016Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)
Bourgin, Y.; Voigt, D.; Käsebier, T.; Kley, E.-B.; Zeitner, U.D.
Conference Paper
2015Double-sided diffractive photo-mask for sub-500nm resolution proximity i-line mask-aligner lithography
Bourgin, Yannick; Siefke, Thomas; Käsebier, Thomas; Kley, Ernst-Bernhard; Zeitner, Uwe D.
Conference Paper
2015Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography
Bourgin, Yannick; Siefke, Thomas; Käsebier, Thomas; Genevee, Pascal; Szeghalmi, Adriana; Kley, Ernst-Bernhard; Zeitner, Uwe D.
Journal Article
2014250 nm period grating transferred by proximity i-line mask-aligner lithography
Bourgin, Yannick; Käsebier, Thomas; Zeitner, Uwe Detlef
Journal Article