Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2011Angle resolved scattering: An effective method for characterizing thin film coatings
Schröder, S.; Herffurth, T.; Blaschke, H.; Duparre, A.
Journal Article
2010ARS: An effective method for characterizing structural and alteration effects in thin film coatings
Schröder, S.; Herffurth, T.; Blaschke, H.; Duparré, A.
Conference Paper
2009Long term tests of resonator optics in ArF excimer lasers
Beermann, N.; Blaschke, H.; Ehlers, H.; Ristau, D.; Wulff-Molder, D.; Jukresch, S.; Matern, A.; Bischoff, M.; Gäbler, D.; Kaiser, N.
Conference Paper
2008Investigation in the degradation of CaF2 outcouplers in excimer lasers operating at 193 nm
Blaschke, H.; Beermann, N.; Ehlers, H.; Ristau, D.; Bischoff, M.; Gäbler, D.; Kaiser, N.; Matern, A.; Wulff-Molder, D.
Conference Paper
2004Radiation resistance of single and multilayer coatings against synchrotron radiation
Guenster, S.; Blaschke, H.; Ristau, D.; Danailov, M.; Trovo, M.; Gatto, A.; Kaiser, N.; Sarto, F.; Flori, D.; Menchini, F.
Conference Paper
2004Surface investigation of VUV-optical components after exposure to high-energy synchrotron radiation
Guenster, S.; Blaschke, H.; Starke, K.; Ristau, D.; Danailov, M.; Diviacco, B.; Gatto, A.; Kaiser, N.; Sarto, F.; Masetti, E.
Conference Paper
2003Radiation resistance of optical materials against synchrotron radiation
Günster, S.; Blaschke, H.; Ristau, D.; Gatto, A.; Heber, J.; Kaiser, N.; Diviacco, B.; Marsi, M.; Trovo, M.; Sarto, F.; Scaglione, S.; Masetti, E.
Conference Paper
2001Absorption limited performance of SiO2/Al2O3 multi-layer coatings at 193nm - a systematic study
Thielsch, R.; Heber, J.; Kaiser, N.; Apel, O.; Mann, K.; Ristau, D.; Blaschke, H.; Arens, W.
Conference Paper
1999Changes in optical interference coatings exposed to 193-nm excimer laser radiation
Heber, J.; Thielsch, R.; Blaschke, H.; Kaiser, N.; Leinhos, U.; Görtler, A.
Conference Paper
1999Current status of radiation resistance of dielectric mirrors in the DUV
Bernitzki, H.; Lauth, H.; Thielsch, R.; Blaschke, H.; Kaiser, N.; Mann, K.R.
Conference Paper
1999Influence of thermal substrate properties on the damage threshold of UV coatings
Blaschke, H.; Martin, S.; Morak, A.; Königsdörfer, C.; Roth, M.; Bincheng, L.; Welsch, E.; Thielsch, R.; Kaiser, N.
Conference Paper
1999Laser resistivity and causes of damage in coating materials for 193 nm by photothermal methods
Blaschke, H.; Thielsch, R.; Heber, J.; Kaiser, N.; Martin, S.; Welsch, E.
Conference Paper
1999Microstructure and radiation interactions of optical interference coatings for 193 nm applications
Heber, J.; Thielsch, R.; Blaschke, H.; Kaiser, N.; Leinhos, U.; Görtler, A.
Conference Paper
1998Stability of optical interference coatings exposed to low-fluence 193 nm ArF radiation
Heber, J.; Thielsch, R.; Blaschke, H.
Conference Paper
1997Investigation of the absorption induced damage in ultraviolet dielectric thin films
Welsch, E.; Ettrich, K.; Blaschke, H.; Schäfer, D.; Kaiser, N.; Thomsen-Schmidt, P.
Journal Article
1996Excimer laser interaction with dielectric thin films
Kaiser, N.; Welsch, E.; Ettrich, K.; Blaschke, H.
Journal Article
1996Interaction of UV-laser-radiation with dielectric thin films
Kaiser, N.; Welsch, E.; Ettrich, K.; Blaschke, H.; Schäfer, D.; Thomsen-Schmidt, P.
Journal Article