Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2008Increasing the predictability of AIMSTM measurements by coupling to resist simulations
Meliorisz, B.; Erdmann, A.; Schnattinger, T.; Strößner, U.; Scherübl, T.; Bisschop, P. de; Philipsen, V.
Conference Paper
2007Impact of alternative mask stacks on the imaging performance at NA 1.20 and above
Philipsen, V.; Mesuda, K.; Bisschop, P. de; Erdmann, A.; Citarella, G.; Evanschitzky, P.; Birkner, R.; Richter, R.; Scherübl, T.
Conference Paper
2006Rigorous mask modeling using waveguide and FDTD methods. An assessment for typical hyper NA imaging problems
Erdmann, A.; Evanschitzky, P.; Citarella, G.; Fühner, T.; Bisschop, P. de
Conference Paper
2006Validity of the Hopkins approximation in simulations of hyper-NA (NA>1) line-space structures for an attenuated PSM mask
Erdmann, A.; Citarella, G.; Evanschitzky, P.; Schermer, H.; Philipsen, V.; Bisschop, P. de
Conference Paper
2005Mask and wafer topography effects in immersion lithography
Erdmann, A.; Evanschitzky, P.; Bisschop, P. de
Conference Paper
2005Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography
Bisschop, P. de; Erdmann, A.; Rathsfeld, A.
Conference Paper