Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
1998Distortion of SIMS Profiles due to Ion Beam Mixing: Shallow Arsenic Implants in Silicon
Montandon, C.; Burenkov, A.; Frey, L.; Pichler, P.; Biersack, J.P.
Journal Article
1994Analytic expressions for ion reflection from amorphous targets
Wierzbicki, R.J.; Biersack, J.P.
Journal Article
1994Reflection approach for the analytical description of light ion implantation into bilayer structures
Wierzbicki, R.J.; Biersack, J.P.; Barthel, A.; Lorenz, J.; Ryssel, H.
Journal Article
1986Ion implantation models for process simulation. Chapter 2
Ryssel, H.; Biersack, J.P.
Book Article
1983Studies on the lattice position of boron in silicon
Fink, D.; Carstanjen, H.D.; Jahnel, F.; Muller, K.; Ryssel, H.; Osei, A.; Biersack, J.P.
Journal Article
1981Description of arsenic and boron profiles implanted into SiO2, Si3N4, and Si using Pearson distributions with four moments.
Jahnel, J.; Ryssel, H.; Prinke, G.; Hoffmann, K.; Mueller, K.; Henkelmann, R.; Biersack, J.P.
Journal Article