Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Novel approach based on continuous trench modelling to predict focused ion beam prepared freeform surfaces
Bilbao-Guillerna, A.; Eachambadi, R.T.; Cadot, G.B.J.; Axinte, D.A.; Billingham, J.; Stumpf, F.; Beuer, S.; Rommel, M.
Journal Article
2017Resistless Ga+ beam lithography for flexible prototyping of nanostructures in different materials by reactive ion etching
Rommel, Mathias; Rumler, Maximilian; Haas, Anke; Beuer, Susanne
Presentation
2015Comparison of silicon and 4H silicon carbide patterning using focused ion beams
Veerapandian, Savita Kaliya Perumal; Beuer, Susanne; Rumler, Maximilian; Stumpf, Florian; Thomas, Keith; Pillatsch, Lex; Michler, Johannes; Frey, Lothar; Rommel, Mathias
Journal Article, Conference Paper
2014Comparison of patterning silicon and silicon carbide using focused ion beam
Veerapandian, S.K.P.; Beuer, Susanne; Rumler, Maximilian; Stumpf, Florian; Thomas, Keith; Pillatsch, L.; Michler, Johannes; Frey, Lothar; Rommel, Mathias
Poster
2013Patterning flat and tilted 4H-SiC by Ga+ resistless lithography and subsequent reactive ion etching
Beuer, Susanne; Rommel, Mathias; Rumler, Maximilian; Haas, Anke; Bauer, Anton J.; Frey, Lothar
Poster
2010Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques
Rommel, M.; Spoldi, G.; Yanev, V.; Beuer, S.; Amon, B.; Jambreck, J.; Petersen, S.; Bauer, A.J.; Frey, L.
Journal Article
2009Experimental observation of FIB induced lateral damage on silicon samples
Spoldi, G.; Beuer, S.; Rommel, M.; Yanev, V.; Bauer, A.J.; Ryssel, H.
Conference Paper, Journal Article
2009UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale
Schmitt, H.; Amon, B.; Beuer, S.; Petersen, S.; Rommel, M.; Bauer, A.J.; Ryssel, H.
Conference Paper, Journal Article
2008Electrical AFM techniques for the advanced characterization of materials in semiconductor technology
Yanev, V.; Rommel, M.; Spoldi, G.; Beuer, S.; Amon, B.; Petersen, S.; Lugstein, A.; Steiger, A.; Bauer, A.J.; Ryssel, H.
Poster
2008Experimental observation of FIB induced lateral damage on silicon samples
Spoldi, G.; Beuer, S.; Rommel, M.; Yanev, V.; Bauer, A.J.; Ryssel, H.
Poster
2008Recent improvements in the integration of field emitters into scanning probe microscopy sensors
Beuer, S.; Rommel, M.; Petersen, S.; Amon, B.; Sulzbach, T.; Engl, W.; Bauer, A.J.; Ryssel, H.
Conference Paper, Journal Article
2008SSRM characterisation of FIB induced damage in silicon
Beuer, S.; Yanev, V.; Rommel, M.; Bauer, A.J.; Ryssel, H.
Conference Paper, Journal Article
2007Accurate parameter extraction for the simulation of direct structuring by ion beams
Beuer, S.; Rommel, M.; Lehrer, C.; Platzgummer, E.; Kvasnica, S.; Bauer, A.J.; Ryssel, H.
Conference Paper, Journal Article
2007Electrical characterization of low dose focused ion beam induced damage in silicon by scanning spreading resistance microscopy
Beuer, S.; Yanev, V.; Rommel, M.; Bauer, A.J.; Ryssel, H.
Poster
2007High throughput manufacturing process of probes for sub-50nm scanning thermal microscopy
Richter, C.; Engl, W.; Weinzierl, P.; Sulzbach, T.; Beuer, S.; Petersen, S.; Stockmeyer, J.; Rommel, M.
Poster
2007Recent improvements in the integration of field emitters into scanning probe microscopy sensors
Beuer, S.; Rommel, M.; Petersen, S.; Amon, B.; Sulzbach, T.; Engl, W.; Bauer, A.J.; Ryssel, H.
Poster
2007Verfahren zur Erzeugung von Submikrometer-Strukturen an einer ausgepraegten Topographie
Lehrer, C.; Beuer, S.; Engl, W.; Richter, C.; Sulzbach, T.
Patent
2006Accurate parameter extraction for the simulation of direct structuring by ion beams
Beuer, S.; Rommel, M.; Lehrer, C.; Platzgummer, E.; Kvasnica, S.; Bauer, A.J.; Ryssel, H.
Poster
2006Active Fuse
Berberich, S.E.; März, M.; Bauer, A.J.; Beuer, S.; Ryssel, H.
Conference Paper