Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Next generation urban mining - laser-based sensing and sorting of electronic scrap
Connemann, S.; Ambrosch, R.; Bergmann, K.; Britten, S.; Brumm, H.; Eschen, M.; Fricke-Begemann, C.; Gehlen, C.; Kurylak, W.; Noll, R.; Sellin, G.; Siguier, M.; Tori, A.; Verglia, F.
Conference Paper
2017Allergen exposure chambers: harmonizing current concepts and projecting the needs for the future - an EAACI Position Paper
Pfaar, O.; Calderon, M.A.; Andrews, C.P.; Angjeli, E.; Bergmann, K.C.; Bonlokke, J.H.; Blay, F. de; Devillier, P.; Ellis, A.K.; Wijk, R.G. van; Hohlfeld, J.M.; Horak, F.; Jacobs, R.L.; Jacobsen, L.; Jutel, M.; Kaul, S.; Larche, M.; Larenas-Linnemann, D.; Mosges, R.; Nolte, H.; Patel, P.; Peoples, L.; Rabin, R.L.; Rather, C.; Salapatek, A.M.; Sigsgaard, T.; Thaarup, S.; Yang, J.; Zieglmayer, P.; Zuberbier, T.; Demoly, P.
Journal Article
2017High-radiance LDP source for mask inspection and beam line applications (Conference Presentation)
Teramoto, Y.; Santos, B.; Mertens, G.; Kops, R.; Kops, M.; Wezyk, A. von; Bergmann, K.; Yabuta, H.; Nagano, A.; Ashizawa, N.; Taniguchi, Y.; Yamatani, D.; Shirai, T.; Kasama, K.
Conference Paper
2017Influence of the electrode wear on the EUV generation of a discharge based extreme ultraviolet light source
Vieker, J.; Bergmann, K.
Journal Article
2017Next generation urban mining - automated disassembly, separation and recovery of valuable materials from electronic equipment: Overview of R&D approaches and first results of the European project ADIR
Noll, R.; Ambrosch, R.; Bergmann, K.; Britten, S.; Brumm, H.; Chmielarz, A.; Connemann, S.; Eschen, M.; Frank, A.; Fricke-Begemann, C.; Gehlen, C.; Gorewoda, T.; Guolo, M.; Kurylak, W.; Makowe, J.; Sellin, G.; Siguier, M.; Tori, M.; Veglia, F.
Conference Paper
2017Spiegel zur Reflexion von EUV-Strahlung in Strahlung im Spektralbereich zwischen 6 nm und 10 nm und optische Anordnung mit dem Spiegel
Naujok, Philipp; Yulin, Sergiy; Kaiser, Norbert; Wezyk, Alexander von; Bergmann, Klaus
Patent
2017Verfahren zur Erzeugung von extremer Ultraviolett und/oder weicher Röntgenstrahlung
Bergmann, Klaus; Wezyk, Alexander von
Patent
2016High-radiance LDP source: Clean, reliable, and stable EUV source for mask inspection
Teramoto, Y.; Santos, B.; Mertens, G.; Kops, R.; Kops, M.; Wezyk, A. von; Bergmann, K.; Yabuta, H.; Nagano, A.; Ashizawa, N.; Taniguchi, Y.; Shirai, T.; Nakamura, K.; Aoki, K.; Kasama, K.
Conference Paper
2016Investigations on the emission in the extreme ultraviolet of a pseudospark based discharge light source
Bergmann, K.; Vieker, J.; Wezyk, A. von
Journal Article
2016Lensless proximity EUV lithography with a Xenon gas discharge plasma radiation
Kim, H.; Danylyuk, S.; Brose, S.; Loosen, P.; Bergmann, K.; Brocklesby, W.S.; Juschkin, L.
Conference Paper
2016Sn-fueled high-brightness compact EUV light source
Teramoto, Y.; Santos, B.; Mertens, G.; Kops, R.; Kops, M.; Wezyk, A. von; Bergmann, K.; Yabuta, H.; Nagano, A.; Ashizawa, N.; Taniguchi, Y.; Shirai, T.; Kasama, K.
Conference Paper
2015Generation of circularly polarized radiation from a compact plasma-based EUV light source for tabletop X-ray magnetic circular dichroism studies
Wilson, D.; Rudolf, D.; Weier, C.; Adam, R.; Winkler, G.; Frömter, R.; Danylyuk, S.; Bergmann, K.; Grützmacher, D.; Schneider, C.M.; Juschkin, L.
Book Article
2015Interferometric broadband Fourier spectroscopy with a partially coherent gas-discharge extreme ultraviolet light source
Rudolf, D.; Bußmann, J.; Odstrcil, M.; Dong, M.; Bergmann, K.; Danylyuk, D.; Juschkin, L.
Journal Article
2015Kollektoranordnung für EUV- und/oder weiche Röntgenstrahlung
Bergmann, Klaus; Küpper, Felix; Vieker, Jochen; Wezyk, Alexander von
Patent
2015Table-Top EUV and Soft X-Ray Microscopy
Herbert, S.; Bahrenberg, L.; Maryasov, A.; Danylyuk, S.; Loosen, P.; Juschkin, L.; Bergmann, K.; Lebert, R.
Journal Article
2014Erratum: "Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies"[Rev. Sci. Instrum. 85, 103110 (2014)]
Wilson, D.; Rudolf, D.; Weier, C.; Adam, R.; Winkler, G.; Frömter, R.; Danylyuk, S.; Bergmann, K.; Grützmacher, D.; Schneider, C.M.; Juschkin, L.
Journal Article
2014Generation of circularly polarized radiation from a compact plasma-based extreme ultraviolet light source for tabletop X-ray magnetic circular dichroism studies
Wilson, D.; Rudolf, D.; Weier, C.; Adam, R.; Winkler, G.; Frömter, R.; Danylyuk, S.; Bergmann, K.; Grützmacher, D.; Schneider, C.M.; Juschkin, L.
Journal Article
2014Verfahren zur Verbesserung der Benetzbarkeit einer rotierenden Elektrode in einer Gasentladungslampe
Bergmann, Klaus; Prümmer, Ralf
Patent
2013Diffraction-assisted extreme ultraviolet proximity lithography for fabrication of nanophotonic arrays
Danylyuk, S.; Kim, H.; Brose, S.; Dittberner, C.; Loosen, P.; Taubner, T.; Bergmann, K.; Juschkin, L.
Journal Article
2013Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources
Danylyuk, S.; Loosen, P.; Bergmann, K.; Kim, H.; Juschkin, L.
Journal Article
2013Vorrichtung und Verfahren zur Erzeugung einer EUV- und/oder weicher Röntgenstrahlung
Bergmann, Klaus
Patent
2012Brilliance scaling of discharge sources for extreme-ultraviolet and soft x-ray radiation for metrology applications
Benk, M.; Bergmann, K.
Journal Article
2012Broadband transmission masks, gratings and filters for extreme ultraviolet and soft X-ray lithography
Brose, S.; Danylyuk, S.; Juschkin, L.; Dittberner, C.; Bergmann, K.; Moers, J.; Panaitov, G.; Trellenkamp, S.; Loosen, P.; Grützmacher, D.
Journal Article
2011EUV actinic mask blank defect inspection: Results and status of concept realization
Maryasov, A.; Herbert, S.; Juschkin, L.; Lebert, R.; Bergmann, K.
Conference Paper
2011EUV dark-field microscopy for defect inspection
Juschkin, L.; Maryasov, A.; Herbert, S.; Aretz, A.; Bergmann, K.; Lebert, R.
Conference Paper
2011Soft X-ray microscopic investigation on self assembling nanocrystals
Benk, M.; Bergmann, K.; Querejeta-Fernández, A.; Srivastava, S.; Kotov, N.A.; Schaefer, D.; Wilhein, T.
Conference Paper
2010Angular ion emission characteristics of a laser triggered tin vacuum arc as light source for extreme ultraviolet lithography
Verbraak, H.; Küpper, F.; Jonkers, J.; Bergmann, K.
Journal Article
2010Defect inspection with an EUV microscope
Herbert, S.; Maryasov, A.; Juschkin, L.; Lebert, R.; Bergmann, K.
Conference Paper
2010Energetic Sn+ irradiation effects on ruthenium mirror specular reflectivity at 13.5-nm
Allain, J.P.; Nieto-Perez, M.; Hendricks, M.R.; Zink, P.; Metzmacher, C.; Bergmann, K.
Journal Article
2009Adaptive spatially resolving detector for the extreme ultraviolet with absolute measuring capability
Benk, M.; Bergmann, K.
Journal Article
2009EUV microscopy for defect inspection by dark-field mapping and zone plate zooming
Juschkin, L.; Freiberger, R.; Bergmann, K.
Journal Article, Conference Paper
2009High power soft x-ray source based on a discharge plasma
Benk, M.; Schäfer, D.; Wilhein, T.; Bergmann, K.
Journal Article, Conference Paper
2009Optical setup for tabletop soft X-ray microscopy using electrical discharge sources
Schäfer, D.; Benk, M.; Bergmann, K.; Nisius, T.; Wiesemann, U.; Wilhein, T.
Journal Article, Conference Paper
2009Optimization of a gas discharge plasma source for extreme ultraviolet interference lithography at a wavelength of 11 nm
Bergmann, K.; Danylyuk, S.V.; Juschkin, L.
Journal Article
2009XUV interference lithography for sub-10 nm patterning
Danylyuk, S.; Juschkin, L.; Brose, S.; Bergmann, K.; Loosen, P.
Book Article
2008Compact soft x-ray microscope using a gas-discharge light source
Benk, M.; Bergmann, K.; Schäfer, D.; Wilhein, T.
Journal Article
2008EUV light sources
Juschkin, L.; Derra, G.; Bergmann, K.
Book Article
2008Extreme ultraviolet lithography
Bergmann, K.; Juschkin, L.; Poprawe, R.
Book Article
2008Extreme ultraviolet plasma source for future lithography
Wagenaars, E.; Mader, A.; Bergmann, K.; Jonkers, J.; Neff, W.
Journal Article
2008Soft x-ray emission from a pulsed gas discharge in a pseudosparklike electrode geometry
Bergmann, K.; Küpper, F.; Benk, M.
Journal Article
2008Thermal and optical characterization of collectors integrated in an Sn-DPP based SoCoMo
Bianucci, G.; Brunton, A.; Cassol, G.L.; Pirovano, G.; Zocchi, F.; Mader, A.; Franken, O.; Bergmann, K.; Scheuermann, H.; Zink, P.
Conference Paper
2007Status report on EUV source development and EUV source applications in EUVL
Bakshi, V.; Lebert, R.; Jägle, B.; Wies, C.; Stamm, U.; Kleinschmidt, J.; Schriever, G.; Ziener, C.; Corthout, M.; Pankert, J.; Bergmann, K.; Neff, W.; Egbert, A.; Gustafson, D.
Conference Paper
2007Vorrichtung und Verfahren fuer die XUV-Mikroskopie
Juschkin, L.; Bergmann, K.; Neff, W.
Patent
2006EUV aources for the alpha-tools
Pankert, J.; Apetz, R.; Bergmann, K.; Damen, M.; Derra, G.; Franken, O.; Janssen, M.; Jonkers, J.; Klein, J.; Kraus, H.; Krücken, T.; List, A.; Loeken, M.; Mader, A.; Metzmacher, C.; Neff, W.; Probst, S.; Prümmer, R.; Rosier, O.; Schwabe, S.; Seiwert, S.; Siemons, G.; Vaudrevange, D.; Wagemann, D.; Weber, A.; Zink, P.; Zitzen, O.
Conference Paper
2005Compact extreme ultraviolet reflectometer for the characterization of grazing incidence optics based on a gas discharge light source
Bergmann, K.; Rosier, O.; Metzmacher, C.
Journal Article
2005Gasentladungslampe fuer EUV-Strahlung
Neff, W.; Bergmann, K.; Jonkers, J.; Pankert, J.; Derra, G.
Patent
2005Integrating Philips' extreme UV source in the alpha-tools
Pankert, J.; Apetz, R.; Bergmann, K.; Derra, G.; Janssen, M.; Jonkers, J.; Klein, J.; Krücken, T.; List, A.; Loeken, M.; Neff, W.; Probst, S.; Prummer, R.; Rosier, O.; Seiwert, S.; Siemons, G.; Vaudrevange, D.; Wagemann, D.; Weber, A.; Zink, P.; Zitzen, O.
Conference Paper
2005Multilayer optics development of EUV microscopy
Braun, S.; Foltyn, T.; Loyen, L. van; Leson, A.; Walter, K.; Bergmann, K.; Neff, W.
Conference Paper
2005Progress on EUV-source development, tool integration and applications
Lebert, R.; Jaegle, B.; Wies, C.; Stamm, U.; Kleinschmidt, J.; Gaebel, K.; Schriever, G.; Pankert, J.; Bergmann, K.; Neff, W.; Egbert, A.
Conference Paper
2005Vorrichtung zur Erzeugung von EUV- und weicher Roentgenstrahlung
Bergmann, K.; Neff, W.
Patent
2004Compact laboratory EUV-lamps: "In-house beamlines" for technologies based on extreme ultraviolet radiation
Lebert, R.; Jägle, B.; Juschkin, L.; Wies, C.; Neff, W.; Barthel, J.; Walter, K.; Bergmann, K.; Schürmann, M.C.; Mißalla, T.
Book Article
2004Design and development of an optical system for EUV-microscopy
Foltyn, T.; Braun, S.; Gawlitza, P.; Leson, A.; Bergmann, K.; Neff, W.; Walter, K.
Conference Paper
2004Extreme ultraviolet radiation from pulsed discharges: A new access to "nanoscopy" and "nanolytics"
Lebert, R.; Wies, C.; Juschkin, L.; Jägle, B.; Neff, W.; Barthel, J.; Walter, K.; Bergmann, K.
Book Article
2004Frequency scaling in a hollow-cathode-triggered pinch plasma as radiation source in the extreme ultraviolet
Rosier, O.; Apetz, R.; Bergmann, K.; Jonkers, J.; Wester, R.; Neff, W.; Pankert, J.
Journal Article
2004Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography
Krücken, T.; Bergmann, K.; Juschkin, L.; Lebert, R.
Journal Article
2004Gasentladungslampe
Bergmann, K.; Vaudrevange, D.
Patent
2004High-throughput EUV reflectometer for EUV mask blanks
Lebert, R.; Wies, C.; Juschkin, L.; Jägle, B.; Meisen, M.; Aschke, L.; Sobel, F.; Seitz, H.; Scholze, F.; Ulm, G.; Walter, K.; Neff, W.; Bergmann, K.; Biel, W.
Conference Paper
2004Method for externally triggering a pseudospark switch for the case where the trigger unit is located on the potential side of an electrode system
Korolev, Y.D.; Frants, O.B.; Geyman, V.G.; Landl, N.V.; Shemyakin, I.A.; Frank, K.; Bischoff, R.; Pankert, J.; Bergmann, K.
Conference Paper
2004Recovery of the dielectric strength of a pseudospark switch in a regime of high pulse repetition rate
Korolev, Y.D.; Frants, O.B.; Geyman, V.G.; Landl, N.V.; Shemyakin, I.A.; Frank, K.; Bischoff, R.; Pankert, J.; Bergmann, K.
Conference Paper
2004Status of EUV-lamp development and demonstration of applications
Lebert, R.; Wies, C.; Jägle, B.; Juschkin, L.; Bieberle, U.; Meisen, M.; Neff, W.; Bergmann, K.; Walter, K.; Rosier, O.; Schuermann, M.C.; Missalla, T.
Conference Paper
2004Status of Philips' extreme UV source
Pankert, J.; Bergmann, K.; Klein, J.; Neff, W.; Rosier, O.; Seiwert, S.; Smith, C.; Probst, S.; Vaudrevange, D.; Siemons, G.; Apetz, R.; Jonkers, J.; Locken, M.; Derra, G.; Krücken, T.; Zink, P.
Conference Paper
2003Anordnung und Verfahren zur Reflektometrie
Lebert, R.; Schriever, G.; Bergmann, K.; Rosier, O.
Patent
2003Physical properties of the HCT EUV source
Pankert, J.; Bergmann, K.; Klein, J.; Neff, W.; Rosier, O.; Seiwert, S.; Smith, C.; Probst, S.; Vaudrevange, D.; Siemons, G.; Apetz, R.; Jonkers, J.; Löken, M.; Bosch, E.; Derra, G.; Krucken, T.; Zink, P.
Conference Paper
2003Vorrichtung zur Erzeugung von Extrem-Ultraviolett- und weicher Roentgenstrahlung aus einer Gasentladung
Neff, W.; Lebert, R.; Bergmann, K.
Patent
2002Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Roentgenstrahlung
Klein, J.; Neff, W.; Seiwert, S.; Bergmann, K.
Patent
2002Verfahren und Vorrichtung zum Erzeugen von Extrem- Ultraviolettstrahlung/weicher Roentgenstrahlung
Neff, W.; Bergmann, K.; Pankert, J.; Rosier, O.
Patent
2002Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Roentgenstrahlung aus einer Gasentladung
Lebert, R.; Bergmann, K.; Schriever, G.; Neff, W.
Patent
2001Comparison of different source concepts for EUVL
Lebert, R.; Bergmann, K.; Juschkin, L.; Rosier, O.; Neff, W.
Conference Paper
2001A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography
Bergmann, K.; Rosier, O.; Lebert, R.; Neff, W.; Poprawe, R.
Journal Article
2001Pinch plasma radiation sources for the extreme ultraviolet
Neff, W.; Bergmann, K.; Rosier, O.; Lebert, R.; Juschkin, L.
Journal Article
2001Preliminary results from key experiments on sources for EUV lithography
Lebert, R.; Aschke, L.; Bergmann, K.; Dusterer, S.; Gabel, K.; Hoffmann, D.; Loosen, P.; Neff, W.; Nickles, P.; Rosier, O.; Poprawe, R.; Rudolph, D.; Sandner, W.; Sauerbrey, R.; Schmahl, G.; Schwoerer, H.; Stiehl, H.; Will, I.; Ziener, C.
Journal Article
2000Electrode phenomena and lifetime consideration in a radial multichannel pseudospark switch
Bergmann, K.; Müller, M.; Reichartz, D.; Neff, W.; Lebert, R.
Journal Article
2000Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: A comparison of different concepts
Schriever, G.; Rahe, M.; Neff, W.; Bergmann, K.; Lebert, R.; Lauth, H.; Basting, D.
Conference Paper
2000Extreme-ultraviolet source development: a comparison of different concepts
Schriever, G.; Rahe, M.; Rebhan, M.; Basting, D.; Walecki, W.J.; Lauth, H.; Lebert, R.; Bergmann, K.; Hoffmann, D.; Rosier, O.; Neff, W.; Poprawe, R.; Sauerbrey, R.; Schroerer, H.; Düsterer, S.; Ziener, C.; Nickles, P.; Stiehl, H.; Will, I.; Sandner, W.; Schahl, G.; Rudolph, D.
Conference Paper
2000Pinch plasma radiation source for extreme ultraviolet lithography with a kilohertz repetition frequency
Bergmann, K.; Rosier, O.; Neff, W.; Lebert, R.
Journal Article
2000Verfahren der Roentgenfluoreszenzmikroskopie
Neff, W.; Rothweiler, D.; Lebert, R.; Bergmann, K.; Boebel, F.G.; Hanke, R.F.
Patent
2000Verfahren zur Erzeugung von Ultraviolettstrahlung
Lebert, R.; Neff, W.; Engel, A.; Bergmann, K.
Patent
1999Comparison of laser produced and gas discharge based EUV sources for different applications
Lebert, R.; Bergmann, K.; Schriever, G.; Neff, W.
Conference Paper
1999Extreme ultraviolet emission of laser-produced plasmas using a cryogenic xenon target
Schriever, G.; Bergmann, K.; Lebert, R.
Journal Article
1999A gas discharged based radiation source for EUV-lithography
Lebert, R.; Bergmann, K.; Schriever, G.; Neff, W.
Conference Paper
1999Gasentladungsschalter
Lebert, R.; Bergmann, K.; Kiefer, J.; Neff, W.
Patent
1999Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma
Bergmann, K.; Schriever, G.; Rosier, O.; Müller, M.; Neff, W.; Lebert, R.
Journal Article
1999Vorrichtung zum Schalten von elektrischen Stroemen hoher Stromstaerken
Neff, W.; Kiefer, J.; Lebert, R.; Bergmann, K.
Patent
1998Electrode phenomena and current distribution in a radial multichannel pseudospark switch
Bergmann, K.; Kiefer, J.; Gavrilescu, C.; Neff, W.; Lebert, R.
Journal Article
1998Laser-produced lithium plasma as a narrow-band extended ultraviolet radiation source for photoelectron spectroscopy
Schriever, G.; Mager, S.; Naweed, A.; Engel, A.; Bergmann, K.; Lebert, R.
Journal Article
1998Narrowband laser produced extreme ultraviolet sources adapted to silicon/molybdenum multilayer optics
Schriever, G.; Bergmann, K.; Lebert, R.
Journal Article
1998A radial multichannel pseudospark switch for high voltage and high current applications
Bergmann, K.; Müller, M.; Neff, W.; Lebert, R.
Conference Paper
1997Compact plasma focus devices: Flexible laboratory sources for applications
Lebert, R.; Engel, A.; Bergmann, K.; Treichel, O.; Gavrilescu, C.; Neff, W.
Conference Paper
1997Influence of the transient plasma dynamics on the scaling of the K-shell line emission in pinch plasmas
Bergmann, K.; Lebert, R.; Neff, W.
Conference Paper
1997Scaling of the K-shell line emission in transient pinch plasmas
Bergmann, K.; Lebert, R.; Neff, W.
Journal Article
1997Spectroscopic investigation of highly transient pinch plasmas
Bergmann, K.; Rosmej, O.N.; Rosmej, F.B.; Engel, A.; Gavrilescu, C.; Neff, W.; Lebert, R.
Journal Article
1997Triggering a radial multichannel pseudospark switch using electrons emitted from material with high dielectric constant
Bergmann, K.; Lebert, R.; Kiefer, J.; Neff, W.
Journal Article
1996Performance of a laboratory X-ray microscope, using z-pinch-generated plasmas, for soft X-ray contact microscopy of living biological specimens
Ford, T.W.; Page, A.M.; Rondot, S.; Lebert, R.; Bergmann, K.; Neff, W.; Gavrilescu, C.; Stead, A.D.
Conference Paper
1996Pinch plasmas as intensive EUV sources for laboratory applications
Lebert, R.; Rothweiler, D.; Engel, A.; Bergmann, K.; Neff, W.
Journal Article
1995Yield optimization of the Lyman-alpha emission in pinch plasmas
Bergmann, K.; Lebert, R.
Journal Article
1994Criteria for maximizing the single-line emission of the pinch plasma in plasma focus devices
Lebert, R.; Bergmann, K.; Rothweiler, D.; Neff, W.
Conference Paper