Fraunhofer-Gesellschaft

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Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2020Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: An experimental and computational study
Beladiya, V.; Becker, M.; Faraz, T.; Kessels, W.M.M.; Schenk, P.; Otto, F.; Fritz, T.; Gruenewald, M.; Helbing, C.; Jandt, K.D.; Tünnermann, A.; Sierka, M.; Szeghalmi, A.
Journal Article
2018Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
Beladiya, V.; Faraz, T.; Kessels, W.M.M.; Tünnermann, A.; Szeghalmi, A.
Conference Paper
2018Growth of Atomic Layer Deposited Ruthenium and its Optical Properties at Short Wavelengths Using Ru(EtCp)2 and Oxygen
Müller, R.; Ghazaryan, L.; Schenk, P.; Wolleb, S.; Beladiya, V.; Otto, F.; Kaiser, N.; Tünnermann, A.; Fritz, T.; Szeghalmi, A.
Journal Article
2018Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
Faraz, T.; Knoops, H.C.M.; Verheijen, M.A.; Helvoirt, C.A.A. van; Karwal, S.; Sharma, A.; Beladiya, V.; Szeghalmi, A.; Hausmann, D.M.; Henri, J.; Creatore, M.; Kessels, W.M.M.
Journal Article