Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
1989Anwendungen der Vakuumbeschichtung zur Verbesserung des Wärme- und Sonnenschutzes im Bauwesen
Schiller, S.; Beister, G.; Becker, H.-J.; Schicht, H.
Journal Article
1989Capacitance-voltage investigations of rechargeable traps in isotype laser heterojunctions
Bach, H.-G.; Beister, G.
Conference Paper
1988Anwendung der Vakuumbeschichtung in der Glasindustrie
Becker, H.-J.; Beister, G.; Kirchhoff, V.; Leuteritz, J.; Poitz, T.; Roth, H.; Schicht, H.; Schneider, S.; Städtler, U.; Szymanski, U.
Conference Paper
1988Reaktives DC-Plasmatron-Sputtern
Heisig, U.; Schiller, S.; Beister, G.; Strümpfel, J.; Reschke, J.; Korndörfer, C.
Conference Paper
1987High-rate vapor deposition and large systems for coating processes
Schiller, S.; Beister, G.; Heisig, U.; Förster, H.
Journal Article
1987Reactive d.c. high-rate sputtering as production technology
Schiller, S.; Heisig, U.; Korndörfer, C.; Beister, G.; Reschke, J.; Steinfelder, K.; Strümpfel, J.
Conference Paper
1987Technical note: Optical properties of reactively evaporated SiOx films
Schiller, S.; Beister, G.
Conference Paper, Journal Article
1987TiN hard coatings deposited on high-speed steel substrates by reactive direct current magnetron sputtering
Schiller, S.; Beister, G.; Reschke, J.; Hötzsch, G.
Journal Article
1984Deposition of hard wear-resistant coatings by reactive D.C. plasmatron sputtering
Schiller, S.; Heisig, U.; Beister, G.; Steinfelder, K.; Strümpfel, J.; Korndörfer, C.; Sieber, W.
Journal Article
1984Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode
Schiller, S.; Beister, G.; Sieber, W.
Journal Article
1982Properties of cadmium stannate thin films produced by reactive high rate d.c. magnetron-plasmatron sputtering
Schiller, S.; Beister, G.; Buedke, E.; Becker, H.-J.; Schicht, H.
Journal Article
1982Vacuum coating of large areas
Schiller, S.; Beister, G.; Neumann, M.; Jäsch, G.
Journal Article, Conference Paper
1981Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive D.C. plasmatron sputtering
Schiller, S.; Beister, G.; Sieber, W.; Schirmer, G.; Hacker, E.
Journal Article
1980Features of and in situ measurement on absorbing TiOx films produced by reactive D.C. magnetron-plasmatron sputtering
Schiller, S.; Beister, G.; Schneider, S.; Sieber, W.
Journal Article
1978Zur Beschichtung von Flachglas mit dünnen, wärmestrahlenreflektierenden Schichten
Schiller, S.; Beister, G.; Becker, H.-J.; Beetz, J.
Journal Article
1976Zur Metallbedampfung von Kunststoffolien und Papier
Schiller, S.; Beister, G.; Neumann, M.; Zeißig, G.
Conference Paper
1975Eigenschaften von verschiedenen strahlungsbeheizten Verdampfersystemen
Schiller, S.; Beister, G.; Roth, H.; Zeissig, G.
Journal Article