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| 1989 | Anwendungen der Vakuumbeschichtung zur Verbesserung des Wärme- und Sonnenschutzes im Bauwesen
Schiller, S.; Beister, G.; Becker, H.-J.; Schicht, H. | Journal Article |
| 1989 | Capacitance-voltage investigations of rechargeable traps in isotype laser heterojunctions
Bach, H.-G.; Beister, G. | Conference Paper |
| 1988 | Anwendung der Vakuumbeschichtung in der Glasindustrie
Becker, H.-J.; Beister, G.; Kirchhoff, V.; Leuteritz, J.; Poitz, T.; Roth, H.; Schicht, H.; Schneider, S.; Städtler, U.; Szymanski, U. | Conference Paper |
| 1988 | Reaktives DC-Plasmatron-Sputtern
Heisig, U.; Schiller, S.; Beister, G.; Strümpfel, J.; Reschke, J.; Korndörfer, C. | Conference Paper |
| 1987 | High-rate vapor deposition and large systems for coating processes
Schiller, S.; Beister, G.; Heisig, U.; Förster, H. | Journal Article |
| 1987 | Reactive d.c. high-rate sputtering as production technology
Schiller, S.; Heisig, U.; Korndörfer, C.; Beister, G.; Reschke, J.; Steinfelder, K.; Strümpfel, J. | Conference Paper |
| 1987 | Technical note: Optical properties of reactively evaporated SiOx films
Schiller, S.; Beister, G. | Conference Paper, Journal Article |
| 1987 | TiN hard coatings deposited on high-speed steel substrates by reactive direct current magnetron sputtering
Schiller, S.; Beister, G.; Reschke, J.; Hötzsch, G. | Journal Article |
| 1984 | Deposition of hard wear-resistant coatings by reactive D.C. plasmatron sputtering
Schiller, S.; Heisig, U.; Beister, G.; Steinfelder, K.; Strümpfel, J.; Korndörfer, C.; Sieber, W. | Journal Article |
| 1984 | Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode
Schiller, S.; Beister, G.; Sieber, W. | Journal Article |
| 1982 | Properties of cadmium stannate thin films produced by reactive high rate d.c. magnetron-plasmatron sputtering
Schiller, S.; Beister, G.; Buedke, E.; Becker, H.-J.; Schicht, H. | Journal Article |
| 1982 | Vacuum coating of large areas
Schiller, S.; Beister, G.; Neumann, M.; Jäsch, G. | Journal Article, Conference Paper |
| 1981 | Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive D.C. plasmatron sputtering
Schiller, S.; Beister, G.; Sieber, W.; Schirmer, G.; Hacker, E. | Journal Article |
| 1980 | Features of and in situ measurement on absorbing TiOx films produced by reactive D.C. magnetron-plasmatron sputtering
Schiller, S.; Beister, G.; Schneider, S.; Sieber, W. | Journal Article |
| 1978 | Zur Beschichtung von Flachglas mit dünnen, wärmestrahlenreflektierenden Schichten
Schiller, S.; Beister, G.; Becker, H.-J.; Beetz, J. | Journal Article |
| 1976 | Zur Metallbedampfung von Kunststoffolien und Papier
Schiller, S.; Beister, G.; Neumann, M.; Zeißig, G. | Conference Paper |
| 1975 | Eigenschaften von verschiedenen strahlungsbeheizten Verdampfersystemen
Schiller, S.; Beister, G.; Roth, H.; Zeissig, G. | Journal Article |