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| 2012 | Low demage magnetron sputtering of TCO films
Bartzsch, H.; Glöß, D.; Frach, P.; Gittner, M.; Gottfried, C.; Suzuki, K. | Conference Paper |
| 2012 | Magnetron assisted PECVD process for deposition of a-Si:H and µc-Si:H from a silane-hydrogen-argon gas mixture
Frach, P.; Pötschick, P.; Bartzsch, H.; Delan, A. | Conference Paper |
| 2012 | A novel nanoparticle source for vacuum deposition
Schmittgens, R.; Holst, E.; Gerlach, G.; Bartzsch, H.; Glöß, D.; Maicu, M.; Frach, P. | Conference Paper |
| 2012 | Präzisionsbeschichtung für Optik, Sensorik und Elektronik
Frach, Peter; Potinecke, Thomas; Slama, Alexander; Bartzsch, Hagen; Glöß, Daniel; Mehlstäubl, Marita | Book Article |
| 2012 | Pulse Magnetron Sputtering with High Power Density-Process and Film Properties
Frach, P.; Gottfried, C.; Fietzke, F.; Klostermann, H.; Bartzsch, H.; Gloess, D. | Conference Paper |
| 2012 | Reactive pulse magnetron sputtering for deposition of piezoelectric AlN layers
Glöß, D.; Bartzsch, H.; Gittner, M.; Frach, P.; Herzog, T.; Walter, S.; Heuer, H. | Conference Paper |
| 2012 | Scratch resistant optical coatings on polymers by magnetron-plasma-enhanced chemical vapor deposition
Täschner, K.; Bartzsch, H.; Frach, P.; Schultheiss, E. | Journal Article, Conference Paper |
| 2012 | Smart ultrasonic sensors systems: Potential of aluminum nitride thin films for the excitation of the ultrasound at high frequencies
Walter, Susan; Herzog, Thomas; Heuer, Henning; Bartzsch, Hagen; Gloess, Daniel | Journal Article |
| 2011 | The deposition of multilayer films on plastic substrates by reactive pulse magnetron sputtering
Fukagawa, T.; Kato, Y.; Bartzsch, H.; Suzuki, K. | Journal Article |
| 2011 | Piezoelectric behaviour of sputtered aluminium nitride thin film for high frequency ultrasonic sensors
Herzog, T.; Walter, S.; Bartzsch, H.; Gittner, M.; Gloess, D.; Heuer, H. | Conference Paper |
| 2011 | Process control in sputtering of optical coatings
Frach, P.; Bartzsch, H.; Glöß, D.; Täschner, K. | Conference Paper |
| 2011 | Properties of piezoelectric AlN layers deposited by reactive pulse magnetron sputtering
Bartzsch, H.; Gittner, M.; Glöß, D.; Frach, P.; Herzog, T.; Walter, S.; Heuer, H. | Conference Paper |
| 2011 | Smart ultrasonic sensors systems: Investigations on aluminum nitride thin films for the excitation of high frequency ultrasound
Walter, S.; Herzog, T.; Heuer, H.; Bartzsch, H.; Glöß, D. | Conference Paper |
| 2010 | Advanced key technologies for magnetron sputtering and PECVD of inorganic and hybrid transparent coatings
Frach, P.; Glöß, D.; Bartzsch, H.; Täschner, K.; Liebig, J.; Schultheiss, E. | Journal Article |
| 2010 | Multifunctional optical coatings on polymers deposited by pulse magnetron sputtering and magnetron enhanced PECVD
Frach, P.; Bartzsch, H.; Täschner, K.; Liebig, J.-S. | Journal Article, Conference Paper |
| 2010 | Scratch resistant optical coatings on polymers by magnetron-PECVD
Taeschner, K.; Bartzsch, H.; Frach, P.; Schultheiß, E. | Conference Paper |
| 2010 | Verfahren zum Abscheiden dielektrischer Schichten im Vakuum sowie Verwendung des Verfahrens
Bartzsch, H.; Frach, P.; Fahland, M.; Gottfried, C.; Pötschick, P. | Patent |
| 2009 | Electrical insulation properties of sputter-deposited SiO2, Si3N4 and Al2O3 films at room temperature and 400 degrees C
Bartzsch, H.; Glöß, D.; Frach, P.; Gittner, M.; Schultheiß, E.; Brode, W.; Hartung, J. | Journal Article, Conference Paper |
| 2009 | Highly insulating Al2O3, SiO2, and Si3N4 films for sensor applications deposited by reactive pulse magnetron sputtering
Frach, P.; Bartzsch, H.; Glöß, D.; Gittner, M.; Schultheiß, E.; Brode, W.; Hartung, J. | Conference Paper |
| 2009 | Multifunctional optical coatings on polymers deposited by pulse magnetron sputtering and magnetron enhanced PECVD
Frach, P.; Bartzsch, H.; Taeschner, K.; Liebig, J.; Schultheiß, E. | Conference Paper |
| 2009 | Reactive pulse magnetron sputtered SiOxNy coatings on polymers
Lau, K.; Weber, J.; Bartzsch, H.; Frach, D.P. | Journal Article, Conference Paper |
| 2008 | Electrically insulating Al2O3 and SiO2 films for sensor and photovoltaic applications deposited by reactive pulse magnetron sputtering, hollow cathode arc activated deposition and magnetron-PECVD
Frach, P.; Bartzsch, H.; Glöß, D.; Fahland, M.; Händel, F. | Journal Article, Conference Paper |
| 2008 | Reactive magnetron sputter technologies for precision optical and antireflective coatings on glass and polymer substrates
Bartzsch, H.; Frach, P.; Lau, K.; Weber, J. | Conference Paper |
| 2008 | Reactive pulse magnetron sputtered SiOxNy coatings on polymers
Lau, K.; Weber, J.; Bartzsch, H.; Frach, P. | Conference Paper |
| 2008 | Sputter deposition of silicon oxynitride gradient and multilayer coatings
Weber, J.; Bartzsch, H.; Frach, P. | Journal Article |
| 2008 | Sputter process with time-variant reactive gas mixture for the deposition of optical multilayer and gradient layer systems
Bartzsch, H.; Weber, J.; Lau, K.; Glöß, D.; Frach, P. | Conference Paper |
| 2008 | Verfahren zum Abscheiden einer Gradientenschicht auf einem Kunststoffsubstrat sowie Kunststoffsubstrat mit einer Gradientenschicht
Bartzsch, H.; Taeschner, K.; Meyer, B.; Frach, P.; Kubusch, J. | Patent |
| 2008 | Verfahren zum Abscheiden einer Kratzschutzbeschichtung auf einem Kunststoffsubstrat
Bartzsch, H.; Frach, P.; Taeschner, K.; Gloess, D.; Gottfried, C.; Fahland, M. | Patent |
| 2007 | Process technology, applications and potentials of magnetron sputtering technology for optical coatings
Vergöhl, M.; Frach, P.; Bartzsch, H.; Pflug, A.; Rickers, C. | Conference Paper |
| 2006 | The deposition of multilayer films on plastic substrates by reactive pulse magnetron sputtering
Fukagawa, T.; Shoji, H.; Kato, Y.; Bartzsch, H.; Suzuki, K. | Conference Paper |
| 2006 | Innovations in stationary magnetron sputtering of optical coatings
Bartzsch, H.; Frach, P.; Weber, J. | Conference Paper |
| 2006 | Nutzung des Pulsmodus als technologischer Parameter beim reaktiven Puls Magnetron Sputtern
Frach, P.; Bartzsch, H.; Glöß, D.; Kirchhoff, V. | Conference Paper |
| 2006 | Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings
Lange, S.; Bartzsch, H.; Frach, P.; Goedicke, K. | Conference Paper, Journal Article |
| 2006 | Silicon nitride thin film with low absorption deposited by high rate reactive pulse magnetron sputtering
Shoji, H.; Fukagawa, T.; Kato, Y.; Bartzsch, H.; Suzuki, K.; Ohno, S.; Takasawa, N.; Sato, Y.; Yoshikawa, M. | Conference Paper |
| 2005 | Deposition of broadband antireflection coatings on plastic substrates by evaporation and reactive pulse magnetron sputtering
Weber, J.; Schulz, U.; Kaiser, N.; Bartzsch, H.; Frach, P. | Conference Paper |
| 2005 | Innovative stationary and in-line sputter technologies for precision optical coatings
Frach, P.; Bartzsch, H.; Liebig, J. | Conference Paper |
| 2005 | Innovative stationary sputter technologies for precision optical and antireflection coatings
Bartzsch, H.; Frach, P.; Hentsch, W. | Conference Paper |
| 2005 | Precision optical and antireflection multilayer and gradient coatings containing reactively sputtered oxides, nitrides and fluorides
Bartzsch, H.; Frach, P.; Weber, J.; Liebig, J.-S. | Conference Paper |
| 2005 | Verfahren zur Herstellung eines Duennschichtsystems durch Puls-Magnetron-Sputtern
Goedicke, K.; Frach, P.; Bartzsch, H.; Kirchhoff, V.; Labitzke, R. | Patent |
| 2005 | Vorrichtung und Verfahren zum Aufbringen eines Duennschichtsystems mittels Zerstaeuben
Bartzsch, H.; Frach, P.; Goedicke, K.; Lange, S. | Patent |
| 2004 | Einrichtung und Verfahren zum Beschichten von Substraten
Frach, P.; Bartzsch, H.; Goedicke, K.; Winkler, T.; Liebig, J.; Kirchhoff, V. | Patent |
| 2004 | Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering
Bartzsch, H.; Lange, S.; Frach, P.; Goedicke, K. | Conference Paper, Journal Article |
| 2004 | Katodenzerstaeubungsverfahren
Bartzsch, H.; Gottfried, C.; Frach, P.; Goedicke, K.; Lange, S. | Patent |
| 2004 | Pulse magnetron sputtering in a reactive gas mixture of variable composition to manufacture multilayer and gradient optical coatings
Lange, S.; Bartzsch, H.; Frach, P.; Goedicke, K. | Conference Paper |
| 2004 | Silicon oxynitride rugate filters grown by reactive pulse magnetron sputtering
Bartzsch, H.; Lange, S.; Frach, P.; Goedicke, K. | Conference Paper |
| 2003 | Abscheidung optisch, elektrisch und akustisch wirksamer Schichten mit dem Doppel-Ring-Magnetron
Bartzsch, H.; Frach, P.; Goedicke, K. | Journal Article |
| 2003 | Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering
Bartzsch, H.; Glöß, D.; Bocher, B.; Frach, P.; Goedicke, K. | Journal Article, Conference Paper |
| 2002 | Energetic substrate bonbardment in reactive sputtering with flange-mounted magnetrons in different pulse modes
Bartzsch, H.; Frach, P.; Goedicke, K.; Gottfried, C. | Conference Paper |
| 2002 | Ensuring long term stability of process and film parameters during target lifetime in reactive magnetron sputtering
Bartzsch, H.; Frach, P.; Goedicke, K.; Böcher, B.; Gottfried, C. | Conference Paper |
| 2001 | Einrichtung zum Magnetronzerstaeuben
Frach, P.; Goedicke, K.; Holfeld, A.; Gottfried, C.; Bartzsch, H. | Patent |
| 2001 | Influence of the unipolar or bipolar pulse mode in reactive magnetron sputtering on the deposition and properties of optical films
Frach, P.; Goedicke, K.; Gottfried, C.; Bartzsch, H.; Klinkenberg, S. | Conference Paper |
| 2001 | Modeling the stability of reactive sputtering processes
Bartzsch, H.; Frach, P. | Conference Paper |
| 2001 | Stationary reactive pulse magnetron sputtering of optical multilayers and gradient layers on 8" substrates
Frach, P.; Bartzsch, H.; Goedicke, K. | Conference Paper |
| 2001 | A versatile coating tool for reactive in-line sputtering in different pulse modes
Frach, P.; Goedicke, K.; Gottfried, C.; Bartzsch, H.; Klinkenberg, S. | Journal Article, Conference Paper |
| 2000 | Anode effects on energetic particle bombardment of the substrate in pulsed magnetron sputtering
Bartzsch, H.; Frach, P.; Goedicke, K. | Conference Paper |
| 2000 | Physikalische Grundlagenuntersuchungen zur Prozeßstabilität und zur Homogenität des Teilchen- und Energiestroms auf das Substrat beim stationären reaktiven Pulssputtern mit dem Doppelringmagnetron. CD-ROM
Bartzsch, H. | Dissertation, CD-ROM |
| 1999 | Different pulse techniques for stationary reactive sputtering with double ring magnetron
Bartzsch, H.; Frach, P.; Goedicke, K.; Gottfried, C. | Journal Article |
| 1997 | The double ring magnetron process module - a tool for stationary deposition of metals, insulators and reactive sputtered compounds
Frach, P.; Gottfried, C.; Bartzsch, H.; Goedicke, K. | Journal Article |
| 1996 | Numerical modelling of charged particle motion in electric and magnetic fields to assist magnetron design
Liebig, J.-S.; Frach, P.; Bartzsch, H.; Schulze, D.; Schwanbeck, H. | Conference Paper |