Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2017Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2 substratum
Junige, Marcel; Löffler, Markus; Geidel, Marion; Albert, Matthias; Bartha, Johann W.; Zschech, Ehrenfried; Rellinghaus, Bernd; Dorp, Willem F. van
Journal Article
2017BEoL post CMP cleaning challenges for 22 nm FD-SOI and beyond
Koch, Johannes; Rehschuh, Stephan; Gerlich, Lukas; Dhavamani, Abitha; Steinke, Philipp; Krause, Robert; Naue, Johannes; Bott, Sascha; Vasilev, Boris; Breuer, Dirk; Seidel, Robert; Preusse, Axel; Bartha, Johann Wolfgang; Uhlig, Benjamin
Conference Paper
2017Charakterisierung der Zuverlässigkeit in der High-k Metal Gate Technologie
Drescher, Maximilian; Erben, Elke; Grass, Carsten; Trentzsch, Martin; Lazarevic, Florian; Leitsmann, Roman; Plaenitz, Philipp; Mchedlidze, Teimuraz; Seidel, Konrad; Liske, Romy; Bartha, Johann Wolfgang
Conference Paper
2017Electrochemical characterization of lithium containing thin films
Dorai Swamy Reddy, Keerthi
: Zybell, Sabine (Betreuer); Neumann, Volker (Betreuer); Bartha, Johann Wolfgang (Gutachter); Albert, Matthias (Gutachter)
Master Thesis
2017PEALD and pulsed CVD of Cobalt thin films using the precursor cyclopentadienylcobalt dicarbonyl
Hossbach, Christoph; Shukla, Shashank; Fischer, Dustin; Reif, Johanna; Bönhardt, Sascha; Geidel, Marion; Albert, Matthias; Bartha, Johann W.
Poster
2016Atomic layer deposition system for fast precursor screening
Shukla, Shashank; Hossbach, Christoph; Sundqvist, Jonas; Bönhardt, Sascha; Feddersen-Clausen, Oliver; Sharma, Varun; Albert, Matthias; Bartha, Johann W.
Poster
2015Development and characterization of a novel CoXN barrier film for future semiconductor technology nodes
Dhavamani, Abitha
: Uhlig, Benjamin (Betr.); Bartha, Johann Wolfgang (Gutachter)
Master Thesis
2015Sensitivity analysis for high accuracy proximity effect correction
Thrun, Xaver; Browning, Clyde; Choi, Kang-Hoon; Figueiro, Thiago; Hohle, Christoph; Saib, Mohamed; Schiavone, Patrick; Bartha, Johann W.
Conference Paper
2013Effects on electron scattering and resist characteristics using assisting underlayers for e-beam direct write lithography
Thrun, Xaver; Choi, Kang-Hoon; Hanisch, Norbert; Hohle, Christoph; Steidel, Katja; Guerrero, Douglas; Figueiro, Thiago; Bartha, Johann W.
Conference Paper
2012Demonstration of 22nm SRAM features with patternable hafnium oxide based resist material using electron-beam lithography
Thrun, Xaver; Choi, Kang-Hoon; Freitag, Martin; Gutsch, Manuela; Hohle, Christoph; Grenville, Andrew; Stowers, Jason K.; Bartha, Johann W.
Conference Paper
2010Untersuchungen zur Oberflächenchemie der Atomlagenabscheidung und deren Einfluss auf die Effizienz von Prozessen
Rose, Martin
: Lakner, Hubert; Bartha, Johann W. (Gutachter); Michaelis, Alexander (Gutachter)
Dissertation