Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2011Experiments and simulation of the diffusion and activation of the n-Type dopants P, As, and Sb implanted into germanium
Koffel, S.; Kaiser, R.J.; Bauer, A.J.; Amon, B.; Pichler, P.; Lorenz, J.; Frey, L.; Scheiblin, P.; Mazzocchi, V.; Barnes, J.-P.; Claverie, A.
Journal Article, Conference Paper
2011Germanium substrate loss during thermal processing
Kaiser, R.J.; Koffel, S.; Pichler, P.; Bauer, A.J.; Amon, B.; Frey, L.; Ryssel, H.
Journal Article, Conference Paper
2010Comprehensive study of focused ion beam induced lateral damage in silicon by scanning probe microscopy techniques
Rommel, M.; Spoldi, G.; Yanev, V.; Beuer, S.; Amon, B.; Jambreck, J.; Petersen, S.; Bauer, A.J.; Frey, L.
Journal Article
2010Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing
Jambreck, J.D.; Schmitt, H.; Amon, B.; Rommel, M.; Bauer, A.J.; Frey, L.
Journal Article, Conference Paper
2010Honeycomb voids due to ion implantation in germanium
Kaiser, R.J.; Koffel, S.; Pichler, P.; Bauer, A.J.; Amon, B.; Claverie, A.; Benassayag, G.; Scheiblin, P.; Frey, L.; Ryssel, H.
Journal Article, Conference Paper
2009Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing
Jambreck, J.D.; Schmitt, H.; Amon, B.; Rommel, M.; Bauer, A.J.; Frey, L.
Poster
2009Transmission-electron-microscopy observation of Pt pillar fabricated by electron-beam-induced deposition
Murakami, K.; Matsubara, N.; Ichikawa, S.; Kisa, T.; Nakayama, T.; Takamoto, K.; Wakaya, F.; Takai, M.; Petersen, S.; Amon, B.; Ryssel, H.
Journal Article
2009UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale
Schmitt, H.; Amon, B.; Beuer, S.; Petersen, S.; Rommel, M.; Bauer, A.J.; Ryssel, H.
Conference Paper, Journal Article
2008Electrical AFM techniques for the advanced characterization of materials in semiconductor technology
Yanev, V.; Rommel, M.; Spoldi, G.; Beuer, S.; Amon, B.; Petersen, S.; Lugstein, A.; Steiger, A.; Bauer, A.J.; Ryssel, H.
Poster
2008Recent improvements in the integration of field emitters into scanning probe microscopy sensors
Beuer, S.; Rommel, M.; Petersen, S.; Amon, B.; Sulzbach, T.; Engl, W.; Bauer, A.J.; Ryssel, H.
Conference Paper, Journal Article
2008Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics
Yanev, V.; Rommel, M.; Lemberger, M.; Petersen, S.; Amon, B.; Erlbacher, T.; Bauer, A.J.; Ryssel, H.; Paskalev, A.; Weinreich, W.; Fachmann, C.; Heitmann, J.; Schroeder, U.
Journal Article
2008UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale
Schmitt, H.; Amon, B.; Petersen, S.; Rommel, M.; Bauer, A.J.; Ryssel, H.
Poster
2007Recent improvements in the integration of field emitters into scanning probe microscopy sensors
Beuer, S.; Rommel, M.; Petersen, S.; Amon, B.; Sulzbach, T.; Engl, W.; Bauer, A.J.; Ryssel, H.
Poster
1997Methods for measuring emissions from agrarian sources
Amon, B.; Boxberger, J.; Amon, T.; Gronauer, A.; Depta, G.; Neser, S.; Schäfer, K.
Conference Paper