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| 2020 | Back-End-of-Line Compatible Low-Temperature Furnace Anneal for Ferroelectric Hafnium Zirconium Oxide Formation
Lehninger, D.; Olivo, R.; Ali, T.; Lederer, M.; Kämpfe, T.; Mart, C.; Biedermann, K.; Kühnel, K.; Roy, L.; Kalkani, M.; Seidel, K. | Journal Article |
| 2020 | Effect of Substrate Implant Tuning on the Performance of MFIS Silicon Doped Hafnium Oxide (HSO) FeFET Memory
Ali, T.; Kühnel, K.; Mertens, K.; Czernohorsky, M.; Rudolph, M.; Duhan, P.; Lehninger, D.; Hoffmann, R.; Steinke, P.; Müller, J.; Houdt, J. van; Seidel, K.; Eng, L.M. | Conference Paper |
| 2020 | FeFET: A versatile CMOS compatible device with game-changing potential
Beyer, S.; Dünkel, S.; Trentzsch, M.; Müller, J.; Hellmich, A.; Utess, D.; Paul, J.; Kleimaier, D.; Pellerin, J.; Müller, S.; Ocker, J.; Benoist, A.; Zhou, H.; Mennenga, M.; Schuster, M.; Tassan, F.; Noack, M.; Pourkeramati, A.; Müller, F.; Lederer, M.; Ali, T.; Hoffmann, R.; Kämpfe, T.; Seidel, K.; Mulaosmanovic, H.; Breyer, E.T.; Mikolajick, T.; Slesazeck, S. | Conference Paper |
| 2020 | Impact of Ferroelectric Wakeup on Reliability of Laminate based Si-doped Hafnium Oxide (HSO) FeFET Memory Cells
Ali, T.; Kühnel, K.; Czernohorsky, M.; Rudolph, M.; Pätzold, B.; Olivo, R.; Lehninger, D.; Mertens, K.; Müller, F.; Lederer, M.; Hoffmann, R.; Mart, C.; Kalkani, M.N.; Steinke, P.; Kämpfe, T.; Müller, J.; Houdt, J. van; Seidel, K.; Eng, L.M. | Conference Paper |
| 2020 | Interplay Between Switching and Retention in HfO2-Based Ferroelectric FETs
Mulaosmanovic, H.; Müller, F.; Lederer, M.; Ali, T.; Hoffmann, R.; Seidel, K.; Zhou, H.; Ocker, J.; Mueller, S.; Dunkel, S.; Kleimaier, D.; Muller, J.; Trentzsch, M.; Beyer, S.; Breyer, E.T.; Mikolajick, T.; Slesazeck, S. | Journal Article |
| 2020 | Screen-Printed Ferroelectric P(VDF-TrFE)-co-PbTiO3 and P(VDF-TrFE)-co-NaBiTi2O6 Nanocomposites for Selective Temperature and Pressure Sensing
Ali, Taher Abu; Groten, Jonas; Clade, Jürgen; Collin, Daniela; Schäffner, Philipp; Zirkl, Martin; Coclite, Anna-Maria; Domann, Gerhard; Stadlober, Barbara | Journal Article |
| 2020 | Structural and Electrical Comparison of Si and Zr Doped Hafnium Oxide Thin Films and Integrated FeFETs Utilizing Transmission Kikuchi Diffraction
Lederer, M.; Kämpfe, T.; Vogel, N.; Utess, D.; Volkmann, B.; Ali, T.; Olivo, R.; Müller, J.; Beyer, S.; Trentzsch, M.; Seidel, K.; Eng, L.M. | Journal Article |
| 2020 | A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO2 Memory FeFET: Pyroelectricity and Reliability
Ali, T.; Kühnel, K.; Czernohorsky, M.; Mart, C.; Rudolph, M.; Pätzold, B.; Lehninger, D.; Olivo, R.; Lederer, M.; Müller, F.; Hoffmann, R.; Metzger, J.; Binder, R.; Steinke, P.; Kämpfe, T.; Müller, J.; Seidel, K.; Eng, L.M. | Journal Article |
| 2020 | A Study on the Temperature-Dependent Operation of Fluorite-Structure-Based Ferroelectric HfO2 Memory FeFET: A Temperature-Modulated Operation
Ali, T.; Kühnel, K.; Czernohorsky, M.; Mart, C.; Rudolph, M.; Pätzold, B.; Lederer, M.; Olivo, R.; Lehninger, D.; Müller, F.; Hoffmann, R.; Metzger, J.; Binder, R.; Steinke, P.; Kämpfe, T.; Müller, J.; Seidel, K.; Eng, L.M. | Journal Article |
| 2019 | Principles and Challenges for Binary Oxide Based Ferroelectric Memory FeFET
Ali, T.; Polakowski, P.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Steinke, P.; Eng, L.M.; Seidel, K. | Conference Paper |
| 2019 | Principles and Challenges for Binary Oxide Based Ferroelectric Memory FeFET
Ali, T.; Polakowski, P.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Steinke, P.; Eng, L.M.; Seidel, K. | Poster |
| 2019 | Theory and Experiment of Antiferroelectric (AFE) Si-Doped Hafnium Oxide (HSO) Enhanced Floating-Gate Memory
Ali, T.; Polakowski, P.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Steinke, P.; Zimmermann, K.; Biedermann, K.; Eng, L.M.; Seidel, K.; Müller, J. | Journal Article |
| 2018 | High Endurance Ferroelectric Hafnium Oxide-Based FeFET Memory Without Retention Penalty
Ali, T.; Polakowski, P.; Riedel, S.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Seidel, K.; Löhr, D.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Steinke, P.; Calvo, J.; Zimmermann, K.; Müller, J. | Journal Article |
| 2018 | Silicon doped hafnium oxide (HSO) and hafnium zirconium oxide (HZO) based FeFET
Ali, T.; Polakowski, P.; Riedel, S.; Büttner, T.; Kämpfe, T.; Rudolph, M.; Pätzold, B.; Seidel, K.; Löhr, D.; Hoffmann, R.; Czernohorsky, M.; Kühnel, K.; Thrun, X.; Hanisch, N.; Steinke, P.; Calvo, J.; Müller, J. | Journal Article |
| 2018 | Tuning parameters and their impact on ferroelectric hafnium oxide
Polakowski, Patrick; Büttner, Teresa; Ali, Tarek Nadi Ismail; Riedel, Stefan; Kämpfe, Thomas; Seidel, Konrad; Müller, Johannes; Pätzold, Björn | Presentation |
| 2016 | Development and electrical characterization of a metal-ferroelectric-insulator semiconductor FET test structure
Ali, Tarek
: Müller, Johannes (Betreuer); Lakner, Hubert (Betreuer); Heyns, Marc | Master Thesis |